Ken Kokubo

Chemical mechanical polishing of patterned copper wafer surface using water-soluble fullerenol slurry

Yasuhiro Takaya, Terutake Hayashi, Masaki Michihata, 2011 .

Performance of water-soluble fullerenol as novel functional molecular abrasive grain for polishing nanosurfaces

Yasuhiro Takaya, Terutake Hayashi, Keisuke Suzuki, 2009 .