Geert Vandenberghe

发表

Alternative EUV mask technology to compensate for mask 3D effects

Lieve Van Look, Geert Vandenberghe, Vicky Philipsen, 2015, Other Conferences.

Through-pitch low-k1 contact hole imaging with CPL technology

Vincent Wiaux, Geert Vandenberghe, Kurt G. Ronse, 2004, Photomask Japan.

NA/σ optimization strategies for an advanced DUV stepper applied to 0.25-μm and sub-0.25-μm critical levels

Geert Vandenberghe, Patrick Jaenen, Kurt G. Ronse, 1997, Advanced Lithography.

PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO)

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

Image imbalance compensation in alternating phase-shift masks towards the 45nm node through-pitch imaging

Lieve Van Look, Geert Vandenberghe, Wolfgang Degel, 2005, SPIE Photomask Technology.

Complementary dipole exposure solutions at 0.29 k1

Geert Vandenberghe, Neal Lafferty, Eric Hendrickx, 2004, SPIE Advanced Lithography.

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Geert Vandenberghe, Peter De Schepper, Danilo De Simone, 2016, SPIE Advanced Lithography.

Lithography Options for the 32 nm Half Pitch Node and Beyond

Vincent Wiaux, Geert Vandenberghe, Eric Hendrickx, 2009, IEEE Transactions on Circuits and Systems I: Regular Papers.

EUV contact holes and pillars patterning

Geert Vandenberghe, Chang-Moon Lim, Danilo De Simone, 2015, Advanced Lithography.

Characterization and optimization of positive-tone DUV resists on TiN substrates

Geert Vandenberghe, Veerle Van Driessche, Peter Zandbergen, 1997, Advanced Lithography.

Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Geert Vandenberghe, Hans-Jürgen Stock, Yasin Ekinci, 2017, Advanced Lithography.

Evolution of roughness during the pattern transfer of high-chi, 10nm half-pitch, silicon-containing block copolymer structures

Geert Vandenberghe, Chris A. Mack, C. Grant Willson, 2018, Advanced Lithography.

Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM

Geert Vandenberghe, Kurt G. Ronse, Staf Verhaegen, 2002, SPIE Photomask Technology.

60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography

Geert Vandenberghe, Eric Hendrickx, Joost Bekaert, 2008, SPIE Advanced Lithography.

Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy

Geert Vandenberghe, Yi Cao, Roel Gronheid, 2014, European Mask and Lithography Conference.

Mighty high-T lithography for 65-nm generation contacts

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

EUV photoresist patterning characterization for imec N7/N5 technology

Geert Vandenberghe, Vito Rutigliani, Peter De Bisschop, 2018, Advanced Lithography.

Unraveling the EUV photoresist reactions: which, how much, and how do they relate to printing performance

Geert Vandenberghe, Peter De Bisschop, Danilo De Simone, 2019, Advanced Lithography.

Separable OPC models for computational lithography

Lieve Van Look, Geert Vandenberghe, Jo Finders, 2008, Photomask Japan.

Integrated fab process for metal oxide EUV photoresist

Geert Vandenberghe, Peter De Schepper, Danilo De Simone, 2015, Advanced Lithography.

Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

Geert Vandenberghe, Peter De Schepper, Danilo De Simone, 2016, SPIE Advanced Lithography.

ArF solutions for low-k1 back-end imaging

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Recent trends and progress in deep-UV lithography

Geert Vandenberghe, Anne-Marie Goethals, Kurt G. Ronse, 1999, Other Conferences.

Reticle quality needs for advanced 193-nm lithography

Vincent Wiaux, Geert Vandenberghe, Kurt G. Ronse, 2001, Photomask Japan.

Analysis of the impact of reticle CD variations on the available process windows for a 100 nm CMOS process

Geert Vandenberghe, Kurt G. Ronse, Staf Verhaegen, 2002, Photomask Technology.

Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning

Geert Vandenberghe, Gijsbert Rispens, Guido Schiffelers, 2019, Advanced Lithography.

Dry development rinse process for ultimate resolution improvement via pattern collapse mitigation

Geert Vandenberghe, Danilo De Simone, Arjun Singh, 2015, Advanced Lithography.

Implementation of DSA for electrical test vehicles at the 7 nm node

Geert Vandenberghe, Julien Ryckaert, Roel Gronheid, 2015 .

Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement

Geert Vandenberghe, Danilo De Simone, Takahiro Kozawa, 2018 .

A 65-nm node SRAM solution using alt-PSM with ArF lithography

Geert Vandenberghe, Artur Balasinski, Frank A.J.M. Driessen, 2004, SPIE Advanced Lithography.

Status of ArF lithography for the 130-nm technology node

Geert Vandenberghe, Frieda Van Roey, Anne-Marie Goethals, 2000, Advanced Lithography.

Litho variations and their impact on the electrical yield of a 32nm node 6TSRAM cell design for manufacturability through design-proces integration II

Geert Vandenberghe, Wim Dehaene, Staf Verhaegen, 2008 .

Progress in 193nm immersion lithography at IMEC

Geert Vandenberghe, Kurt G. Ronse, Eric Hendrickx, 2005, Other Conferences.

Characterizing and modeling electrical response to light for metal-based EUV photoresists

Geert Vandenberghe, John J. Biafore, Danilo De Simone, 2016, SPIE Advanced Lithography.

Exploring the readiness of EUV photo materials for patterning advanced technology nodes

Geert Vandenberghe, Danilo De Simone, Ming Mao, 2017, Advanced Lithography.

Split and design guidelines for double patterning

Vincent Wiaux, Geert Vandenberghe, Patrick Jaenen, 2008, SPIE Advanced Lithography.

Full phase-shifting methodology for 65-nm node lithography

Geert Vandenberghe, Christophe Pierrat, Frank A. J. M. Driessen, 2003, SPIE Advanced Lithography.

Litho variations and their impact on the electrical yield of a 32nm node 6T SRAM cell

Geert Vandenberghe, Wim Dehaene, Staf Verhaegen, 2008, SPIE Advanced Lithography.

Optical proximity stability control of ArF immersion clusters

Lieve Van Look, Geert Vandenberghe, Joost Bekaert, 2011, Advanced Lithography.

Experimental validation of stochastic modeling for negative-tone develop EUV resists

Geert Vandenberghe, Danilo De Simone, Eric Hendrickx, 2015, Advanced Lithography.

KrF lithography for 130 nm

Geert Vandenberghe, Kurt G. Ronse, Jo Finders, 2000, Advanced Lithography.

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Difference in EUV photoresist design towards reduction of LWR and LCDU

Geert Vandenberghe, Danilo De Simone, Jing Jiang, 2017, Advanced Lithography.

Litho enhancements for 45nm-node MuGFETs

Geert Vandenberghe, Staf Verhaegen, Monique Ercken, 2005 .

Calibrated PSCAR stochastic simulation

Geert Vandenberghe, Hans-Jürgen Stock, Peter De Bisschop, 2019, Advanced Lithography.

Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure

Geert Vandenberghe, John S. Petersen, Ivan Pollentier, 2018, Advanced Lithography.

A methodology for double patterning compliant split and design

Vincent Wiaux, Geert Vandenberghe, Mireille Maenhoudt, 2008, Lithography Asia.

ArF lithography options for 100-nm technologies

Geert Vandenberghe, Kurt G. Ronse, Kevin D. Lucas, 2001, SPIE Advanced Lithography.

Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm nodes

Geert Vandenberghe, Shinji Tarutani, Joost Bekaert, 2010 .

The 35th International Conference on Micro- and Nano-Engineering (MNE) 28 September-1 October, 2009 Ghent, Belgium Preface

Geert Vandenberghe, Kurt G. Ronse, Liesbet Lagae, 2010 .

Staggered pillar patterning using 0.33NA EUV lithography

Lieve Van Look, Geert Vandenberghe, Jeroen Van de Kerkhove, 2019, Advanced Lithography.

Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node

Geert Vandenberghe, Staf Verhaegen, Mircea Dusa, 2007, SPIE Advanced Lithography.

High-volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL

Geert Vandenberghe, Danilo De Simone, Philippe Foubert, 2017, Advanced Lithography.

Calibration and application of a DSA Compact model for graphoepitaxy hole processes using contour-based metrology

Geert Vandenberghe, J. Andres Torres, Yuri Granik, 2014, Photomask Technology.

Tool-to-tool optical proximity effect matching

Geert Vandenberghe, Jeroen Van de Kerkhove, Guido Schiffelers, 2008, SPIE Advanced Lithography.

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture

Geert Vandenberghe, Bruce W. Smith, Yuri Granik, 2009 .

Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node

Geert Vandenberghe, Wolfgang Degel, Vicky Philipsen, 2005, SPIE Photomask Technology.

3D mask modeling for EUV lithography

Geert Vandenberghe, Konstantinos Adam, Bruce W. Smith, 2012, Advanced Lithography.

Optical proximity effects correction at 0.25 um incorporating process variations in lithography

Geert Vandenberghe, Kurt G. Ronse, Luc Van den Hove, 1997, Advanced Lithography.

Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography

Lieve Van Look, Geert Vandenberghe, Jan Richter, 2010, Advanced Lithography.

The economic impact of EUV lithography on critical process modules

Geert Vandenberghe, Diederik Verkest, Naoto Horiguchi, 2014, Advanced Lithography.

CD control comparison for sub-0.18-μm patterning using 248-nm lithography and strong resolution enhancement techniques

Geert Vandenberghe, Kurt G. Ronse, Robert John Socha, 1999, Advanced Lithography.

The hidden energy tail of low energy electrons in EUV lithography

Geert Vandenberghe, Danilo De Simone, Sergey Babin, 2019, Advanced Lithography.

EUV resist sensitization and roughness improvement by PSCAR with in-line UV flood exposure system

Geert Vandenberghe, Hans-Jürgen Stock, Kazuhiro Takeshita, 2018, Advanced Lithography.

Experimental evaluation of bull's-eye illumination for assist-free random contact printing at sub-65nm node

Geert Vandenberghe, Jo Finders, Andre Engelen, 2006, SPIE Advanced Lithography.

Experimental verification of source-mask optimization and freeform illumination for 22-nm node static random access memory cells

Geert Vandenberghe, Jens Timo Neumann, Mircea Dusa, 2011 .

Pattern Displacement Induced by Lens Aberrations

Geert Vandenberghe, Kurt G. Ronse, Jo Finders, 2002, Photomask Technology.

State-of-the-art of EUV materials for N5 logic and DRAM applications

Geert Vandenberghe, Danilo De Simone, Ivan Pollentier, 2018, Photomask Technology.

Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Photomask Technology.

Experimental study of sub-DSA resolution assist features (SDRAF)

Geert Vandenberghe, Hon-Sum Philip Wong, He Yi, 2015, Advanced Lithography.

Implementation of templated DSA for via layer patterning at the 7nm node

Geert Vandenberghe, Germain Fenger, Julien Ryckaert, 2015, Advanced Lithography.

Process optimization for sub-100-nm gate patterns using phase edge lithography

Geert Vandenberghe, Koen van Ingen Schenau, Bert Vleeming, 2001, SPIE Advanced Lithography.

(Sub-) 100-nm gate patterning using 248-nm alternating PSM

Geert Vandenberghe, Patrick Jaenen, Kurt G. Ronse, 2001, Photomask Japan.

Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs

Geert Vandenberghe, Linard Karklin, Kurt G. Ronse, 2002, SPIE Photomask Technology.

Mask topography effect in chromeless phase lithography

Geert Vandenberghe, Vicky Philipsen, Robert Socha, 2004, SPIE Photomask Technology.

Opportunities and challenges for DSA in logic and memory

Geert Vandenberghe, Julien Ryckaert, Arjun Singh, 2016 .

Immersion lithography and double patterning in advanced microelectronics

Vincent Wiaux, Geert Vandenberghe, Mireille Maenhoudt, 2010, International Conference on Micro- and Nano-Electronics.

Image enhancement through square illumination shaping

Geert Vandenberghe, Bruce W. Smith, 2002, SPIE Advanced Lithography.

Novel metal containing resists for EUV lithography extendibility

Geert Vandenberghe, Danilo De Simone, Ivan Pollentier, 2016, SPIE Advanced Lithography.

Toward sub-20nm pitch Fin patterning and integration with DSA

Geert Vandenberghe, David Laidler, Roel Gronheid, 2016, SPIE Advanced Lithography.

Multi-trigger resist patterning with ASML NXE3300 EUV scanner

Geert Vandenberghe, Danilo De Simone, John Roth, 2018, Advanced Lithography.

Design strategy for integrating DSA via patterning in sub-7 nm interconnects

Geert Vandenberghe, H.-S. Philip Wong, Wim Dehaene, 2016, SPIE Advanced Lithography.

Experimental verification of a model-based decomposition method for double dipole lithography

Geert Vandenberghe, Tsann-Bim Chiou, Alek Chen, 2004, SPIE Advanced Lithography.

Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography

Geert Vandenberghe, Vicky Philipsen, Eric Hendrickx, 2006, Photomask Japan.

Optical extensions integration for a 0.314-μm2 45-nm node 6-transistor SRAM cell

Vincent Wiaux, Geert Vandenberghe, Eric Hendrickx, 2005, SPIE Advanced Lithography.

EUV extendibility via dry development rinse process

Geert Vandenberghe, Danilo De Simone, Tao Zheng, 2016, SPIE Advanced Lithography.

Design method and algorithms for directed self-assembly aware via layout decomposition in sub-7 nm circuits

Geert Vandenberghe, H.-S. Philip Wong, Wim Dehaene, 2016 .

Model-based OPC for first-generation 193-nm lithography

Geert Vandenberghe, Kevin D. Lucas, Staf Verhaegen, 2001, SPIE Advanced Lithography.

N7 logic via patterning using templated DSA: implementation aspects

Geert Vandenberghe, Yi Cao, Germain Fenger, 2015, Other Conferences.

Assessment of OPC effectiveness using two-dimensional metrics

Vincent Wiaux, Geert Vandenberghe, Kurt G. Ronse, 2002, SPIE Advanced Lithography.

Templated DSA vias in sub-7 nm circuits: Design strategy and DSA-aware via decomposition

Geert Vandenberghe, H.-S. Philip Wong, Wim Dehaene, 2016 .

Optical extensions towards the 45-nm node

Lieve Van Look, Geert Vandenberghe, Eric Hendrickx, 2004, SPIE Advanced Lithography.

Bottom-ARC optimization methodology for 0.25-μm lithography and beyond

Geert Vandenberghe, James E. Lamb, Patrick Jaenen, 1998, Advanced Lithography.

Reticle imaging and metrology using a CD-SEM at IMEC

Geert Vandenberghe, Thomas Marschner, A. James, 2000, European Mask and Lithography Conference.

Compensating measured intra-wafer ring oscillator stage delay with intra-wafer exposure dose corrections

Geert Vandenberghe, Jo Finders, Staf Verhaegen, 2006, SPIE Advanced Lithography.

High-NA ArF lithography for 70-nm technologies

Geert Vandenberghe, Kevin D. Lucas, Patrick K. Montgomery, 2002, SPIE Advanced Lithography.

Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement

Geert Vandenberghe, Danilo De Simone, Takahiro Kozawa, 2018, Advanced Lithography.

Gray assist bar OPC

Geert Vandenberghe, Neal Lafferty, Bruce W. Smith, 2004, SPIE Advanced Lithography.

SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features

Geert Vandenberghe, A. Meyyappan, Sylvain Muckenhirn, 2001, SPIE Advanced Lithography.

Impact of DSA process variability on circuit performance

Geert Vandenberghe, Wim Dehaene, Julien Ryckaert, 2016 .

Application challenges with double patterning technology (DPT) beyond 45 nm

Vincent Wiaux, Geert Vandenberghe, Jo Finders, 2006, SPIE Photomask Technology.

Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274µm2 6T-SRAM cell and advanced CMOS logic circuits

Vincent Wiaux, Geert Vandenberghe, Patrick Jaenen, 2005 .

The need for EUV lithography at advanced technology for sustainable wafer cost

Geert Vandenberghe, Diederik Verkest, Kurt G. Ronse, 2013, Advanced Lithography.

Extending ArF to the 65-nm node with full-phase lithography

Geert Vandenberghe, Kurt G. Ronse, Christophe Pierrat, 2003, SPIE Advanced Lithography.

Early learning on hyper-NA lithography using two-beam immersion interference

Lieve Van Look, Geert Vandenberghe, Eric Hendrickx, 2006, SPIE Advanced Lithography.

Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

Geert Vandenberghe, Yuri Granik, Eric Hendrickx, 2008, SPIE Advanced Lithography.

Proximity bias swing: origin and characterization

Geert Vandenberghe, Jos de Klerk, Peter Zandbergen, 1998, Advanced Lithography.

Advances in defect performance in metal oxide photoresists for EUV lithography

Geert Vandenberghe, Amrit Narasimhan, Peter De Schepper, 2021 .

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Geert Vandenberghe, Makoto Muramatsu, Danilo De Simone, 2021, Advanced Lithography.

Evaluation of stray light and quantitative analysis of its impact on lithography

Geert Vandenberghe, Peter De Bisschop, Young-Chang Kim, 2005 .

Printability study of EUV double patterning for CMOS metal layers

Geert Vandenberghe, Danilo De Simone, 2019, Extreme Ultraviolet (EUV) Lithography X.

Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling

Geert Vandenberghe, Kurt G. Ronse, Anthony Yen, 1996 .

Fluid-photoresist interactions and imaging in high-index immersion lithography

Geert Vandenberghe, Eric Hendrickx, Roger H. French, 2009 .

The Role of Underlayers in EUVL

Geert Vandenberghe, Danilo De Simone, Alexis Franquet, 2018, Journal of Photopolymer Science and Technology.

Metal Containing Resist Readiness for HVM EUV Lithography

Geert Vandenberghe, Ming Mao, Frederic Lazzarino, 2016 .

Metal Sensitizer in Chemically Amplified EUV Resist: a Study of Sensitivity Enhancement and Dissolution

Geert Vandenberghe, Jing Jiang, Danilo De Simone, 2017 .

Characterization of stray light of ArF lithographic tools: Modeling of power spectral density of an optical pupil

Geert Vandenberghe, Peter De Bisschop, Young-Chang Kim, 2006 .

Photo Material Readiness at the Eve of EUVL HVM

Geert Vandenberghe, Danilo De Simone, Pieter Vanelderen, 2017 .

Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-Chi Block Copolymers.

Geert Vandenberghe, C. Grant Willson, Christopher J. Ellison, 2019, ACS applied materials & interfaces.

Metal-containing Materials as Turning Point of EUV Lithography

Geert Vandenberghe, Ivan Pollentier, Danilo De Simone, 2015 .