Srini Raghavan

发表

Gold and silver extraction by ammoniacal thiosulfate leaching from a rhyolite ore

S. Raghavan, D. Zipperian, Srini Raghavan, 1988 .

Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves

Manish K Keswani, S. Raghavan, M. Keswani, 2014 .

Wettability and cleaning of silicon wafers in tetramethyl ammonium hydroxide-based solutions

Srini Raghavan, Joong-Suck Jeon, 1993 .

Minimization of chemical-mechanical planarization (CMP) defects and post-CMP cleaning

Milind Weling, S. Raghavan, Srini Raghavan, 1999 .

Control of sonoluminescence signal in deionized water using carbon dioxide

Sangita Kumari, Manish K Keswani, Pierre A Deymier, 2011 .

Streaming and removal forces due to second-order sound field during megasonic cleaning of silicon wafers

Abdelkrim Khelif, Bahram Djafari-Rouhani, Pierre A Deymier, 2000 .

Particulate Science and Technology in the Engineering of Slurries for Chemical Mechanical Planarization

Manish K Keswani, S. Raghavan, R. Jia, 2008 .

Characterization of highly hydrophobic coatings deposited onto pre-oxidized silicon from water dispersible organosilanes

David J. Monk, Bishnu P. Gogoi, Marcia Almanza-Workman, 2003 .

Treatment of Alumina and Silica Chemical Mechanical Polishing Waste by Electrodecantation and Electrocoagulation

James C Baygents, S. Raghavan, J. Baygents, 1999 .