Laetitia Rolland

Highly anisotropic silicon and polysilicon room-temperature etching using fluorinebased high density plasmas

Angeliki Tserepi, Evangelos Gogolides, Christophe Cardinaud, 1998 .

SiO2/Si selectivity in high density CHF3/CH4 plasmas: Role of the fluorocarbon layer

C. Cardinaud, G. Turban, Ch. Cardinaud, 2000 .