Tadahiro Ohmi

发表

Special Issue on Vacuum Technology. Ultra Clean Technology for Semiconductor Manufacturing.

Tadashi Shibata, Tadahiro Ohmi, Tadashi Shibata, 1991 .

Model of coating and drying process for flat polymer film fabrication

Kazuhiro Takeshita, Hiroyuki Kagami, Shinji Kobayashi, 2002, Photomask Japan.

Apparatus and method for production of multilayer printed circuit boards

Tadahiro Ohmi, Hidetoshi Murakami, 2000 .

Strategy in Cleaning Processes for Future Materials

Tadahiro Ohmi, Tadahiro Ohmi, Geun-Min Choi, 2000 .

Reliability of parameters of associated base straight line in step height samples: Uncertainty evaluation in step height measurements using nanometrological AFM

Kiyoshi Takamasu, Ichiko Misumi, Yasushi Azuma, 2006 .

Influence of carbon contamination on ultrathin gate oxide reliability

T. Iwamoto, Tadahiro Ohmi, Toshiki Miyake, 1996, Advanced Lithography.

High-resolution pattern formation featuring excellent dimension correlation by enhanced wettability development technology

Hisayuki Shimada, Mamoru Miyawaki, Tadahiro Ohmi, 1993, Advanced Lithography.

Advanced Ultvapure Water Distribution Technology for ULSI Manufacturing

Tadahiro Ohmi, 1992 .

New Era of Semiconductor Manufacturing (1)Breakthrough for Everlasting Prosperity of Semiconductor Industry --Proposal of very compact manufacturing system for 300 mm wafer from Tohoku University

Tadahiro Ohmi, 1997 .

A Technology for Reducing Flicker Noise for ULSI Applications

Kazufumi Watanabe, Shigetoshi Sugawa, Tadahiro Ohmi, 2003 .