P.C. Fazan

Highly reliable SiO/sub 2//Si/sub 3/N/sub 4/ stacked dielectric on rapid-thermal-nitrided rugged polysilicon for high-density DRAM's

G. Lo, D. Kwong, P. Fazan, 1992, IEEE Electron Device Letters.

Thin nitride films on textured polysilicon to increase multimegabit DRAM cell charge capacity

P.C. Fazan, R.R. Lee, 1990, IEEE Electron Device Letters.