Liheng Zhao

Study of Isotropic and Si-Selective Quasi Atomic Layer Etching of Si1−xGex

Guilei Wang, Huilong Zhu, H. Radamson, 2020 .

Selective Digital Etching of Silicon-Germanium using Nitric and Hydrofluoric Acids.

A. Du, Guilei Wang, Huilong Zhu, 2020, ACS applied materials & interfaces.

Strained Si0.2Ge0.8/Ge multilayer Stacks Epitaxially Grown on a Low-/High-Temperature Ge Buffer Layer and Selective Wet-Etching of Germanium

Luyue Xie, A. Du, Guilei Wang, 2020, Nanomaterials.

A Study of Selectively Digital Etching Silicon-Germanium with Nitric and Hydrofluoric Acids

Technology of China, A. Du, Guilei Wang, 2020, 2003.03529.