S. Archambault

Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.

Olivier Joubert, Gilles Cunge, Marc Zelsmann, 2014, ACS applied materials & interfaces.

Development of plasma etching processes to pattern sub-15 nm features with PS-b-PMMA block copolymer masks: Application to advanced CMOS technology

T. Chevolleau, R. Tiron, X. Chevalier, 2014 .

Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design

M. Shaw, M. Zelsmann, D. Borah, 2013 .