Lingkuan Meng

发表

Effect of process parameters on sidewall damage in deep silicon etch

Jiang Yan, Lingkuan Meng, Jiang Yan, 2015 .

Novel GAA Si Nanowire p-MOSFETs With Excellent Short-Channel Effect Immunity via an Advanced Forming Process

Tianchun Ye, Junjie Li, Chao Zhao, 2018, IEEE Electron Device Letters.

A Novel Nanofabrication Technique of Silicon-Based Nanostructures

Yayi Wei, Jianfeng Gao, Xiaobin He, 2016, Nanoscale Research Letters.

Transistor gate line roughness formation and reduction in sub-30-nm gate patterning using multilayer hard mask structure

Xiaobin He, Junfeng Li, Jiang Yan, 2014 .

CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single Mask

Yayi Wei, Jianfeng Gao, Xiaobin He, 2015, Nanoscale Research Letters.

Mini-review: Recent advances in post-translational modification site prediction based on deep learning

Ka-chun Wong, Xingjian Chen, Hongyan Sun, 2022, Computational and structural biotechnology journal.

A straightforward and CMOS-compatible nanofabrication technique of periodic SiO2 nanohole arrays

Yayi Wei, Jianfeng Gao, Xiaobin He, 2015, Nanotechnology.

Study of the perpendicular self-assembly of a novel high-χ block copolymer without any neutral layer on a silicon substrate

Yayi Wei, Xing Wu, Libin Zhang, 2019, RSC advances.

Cost-effective amorphous silicon hard mask patterning sub-45nm contact trench

Jianfeng Gao, Xiaobin He, Jiang Yan, 2014, IEEE International Conference on Solid-State and Integrated Circuit Technology.

Gate patterning in 14 nm and beyond nodes: from planar devices to three dimensional Finfet devices

Yayi Wei, Xiaobin He, Junfeng Li, 2016 .

Innovatively composite hard mask to feature sub-30 nm gate patterning

Jun Luo, Xiaobin He, Junfeng Li, 2014 .

Silicon photonics process development based on a 200-mm CMOS platform

Zhihua Li, Jiang Yan, Daoqun Liu, 2016, SPIE/COS Photonics Asia.

Micro-phase separation behavior study of the same system of a novel block copolymer (PS-b-PC)

Weichen Liu, Baolin Zhang, Lingkuan Meng, 2019, Advanced Lithography.

Mechanism study of sidewall damage in deep silicon etch

Jiang Yan, Lingkuan Meng, Jiang Yan, 2014 .

Facile fabrication of Si-based nanostructures

Jiang Yan, Lingkuan Meng, Jiang Yan, 2017, Advanced Lithography.

Absorption Behavior of a Modified Cellulose Hydrogel for both Fluoride and Arsenic

Yong Huang, Min Wu, Ye Tian, 2013 .

Study of the ordered assembly morphologies of diblock copolymers on the same substrate

Lingkuan Meng, Baolin Zhang, Zili Li, 2022, RSC advances.

FOI FinFET with ultra-low parasitic resistance enabled by fully metallic source and drain formation on isolated bulk-fin

Tianchun Ye, Junjie Li, Chao Zhao, 2016, 2016 IEEE International Electron Devices Meeting (IEDM).

Novel 14-nm Scallop-Shaped FinFETs (S-FinFETs) on Bulk-Si Substrate

Peizhen Hong, Huaxiang Yin, Miao Xu, 2015, Nanoscale Research Letters.

Influence of the hard masks profiles on formation of nanometer Si scalloped fins arrays

H. Yin, Jiang Yan, H. Tu, 2018, Microelectronic Engineering.

Planar Bulk MOSFETs With Self-Aligned Pocket Well to Improve Short-Channel Effects and Enhance Device Performance

Tianchun Ye, Q. Liang, Hongyu Yu, 2015, IEEE Transactions on Electron Devices.

Mini-review Recent advances in post-translational modification site prediction based on deep learning

Ka-chun Wong, Xingjian Chen, Hongyan Sun, 2022 .