Michael T. Reilly

发表

Photonic crystal beam-splitting laser diode

Michael T. Reilly, Wenli Huang, F. C. Jain, 2004, SPIE Optics + Photonics.

Evolution of thermal cure resist for double patterning applications

Michael T. Reilly, Young Cheol Bae, Vaishali Vohra, 2010, Advanced Lithography.

Evolution of negative tone development photoresists for ArF lithography

Michael T. Reilly, Cecily Andes, Thomas Cardolaccia, 2012, Other Conferences.

MEEF management and the effect of assist feature optical proximity corrections

Michael T. Reilly, Stewart A. Robertson, Colin R. Parker, 2001, Microelectronic and MEMS Technologies.

Validation of the predictive power of a calibrated physical stochastic resist model

John J. Biafore, Michael T. Reilly, Jerome Wandell, 2009, Lithography Asia.

Aberration's impact on subresolution contact hole process windows in ultrathin imaging resist

Michael T. Reilly, Jo Finders, Mircea Dusa, 2003, SPIE Advanced Lithography.

Prebake and post-exposure bake effects on the dissolution of AZ-PF

Michael T. Reilly, Azalia A. Krasnoperova, Franco Cerrina, 1993, Advanced Lithography.

Interferometric investigation of x-ray mask fabrication distortions

Roxann L. Engelstad, Michael T. Reilly, Matthew E. Hansen, 1994, Advanced Lithography.

SPR surface enhanced fluorescence with a gold-coated corrugated sensor chip

Michael T. Reilly, Peter A. Nessing, Ernest F. Guignon, 2006, SPIE BiOS.

Process window overlap for posts and lines and spaces: optimization by resist type, optical settings, and mask bias

Michael T. Reilly, Karen Kvam, Jentry Willie, 1999, Other Conferences.

Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes

Michael T. Reilly, Doris Kang, Stewart A. Robertson, 2001, Microelectronic and MEMS Technologies.

MEEF measurement and model verification for 0.3-k1 lithography

Michael T. Reilly, Colin R. Parker, 2000 .

Correlation Of Submicron Linewidths Derived From Electrical And Electron-Optical Methods.

Michael T. Reilly, 1986, Optics & Photonics.

Implementation of two-state alignment system into CXrL aligner (Poster Paper)

Michael T. Reilly, Paul D. Anderson, J. Wallace, 1992, Advanced Lithography.

X-ray lithography processing at CXrL from beamline to quarter-micron NMOS devices

Franco Cerrina, Michael T. Reilly, Gong Chen, 1994, Advanced Lithography.

Reflection control for line features of multiple pitches at hyper NA

Michael T. Reilly, Nick Pugliano, Michael Wagner, 2008, SPIE Advanced Lithography.

Impact of isofocal bias on MEEF management

Michael T. Reilly, Colin R. Parker, 2002, SPIE Advanced Lithography.

Maximizing common process latitude by integrated process development for 130-nm lithography

Michael T. Reilly, Colin R. Parker, Frank W. Fischer, 2002, SPIE Advanced Lithography.

BARC technology for 1.35 NA lithography

Michael T. Reilly, Ken Spizuoco, Gary Guohong Zhang, 2008, Lithography Asia.

Advanced patterning solutions based on double exposure: double patterning and beyond

Michael T. Reilly, Young Cheol Bae, George G. Barclay, 2009, Lithography Asia.

Predictive linewidth roughness and CDU simulation using a calibrated physical stochastic resist model

John J. Biafore, Michael T. Reilly, Jerome Wandell, 2010, Advanced Lithography.

Simulation of optical lithography in the presence of topography and spin-coated films

Trey Graves, John J. Biafore, Michael T. Reilly, 2009, Advanced Lithography.

X-ray mask fabrication process

Franco Cerrina, Michael T. Reilly, Gregory M. Wells, 1995, Photomask and Next Generation Lithography Mask Technology.

The impact of optical non-idealities in litho-litho-etch processing

Trey Graves, John J. Biafore, Michael T. Reilly, 2010, Advanced Lithography.

Factors affecting pitch bias in lithography simulation

Michael T. Reilly, Stewart A. Robertson, John F. Bohland, 2000, Advanced Lithography.

Combining physical resist modeling and self-consistent field theory for pattern simulation in directed self-assembly

Michael T. Reilly, Mark D. Smith, Valeriy V. Ginzburg, 2013, Advanced Lithography.

Physical modeling of developable BARC at KrF

John J. Biafore, Michael T. Reilly, Stewart A. Robertson, 2011, Advanced Lithography.

Track oriented chemically-amplified resist processes for quarter-micron lithography

Michael T. Reilly, James W. Taylor, Azalia A. Krasnoperova, 1993, Advanced Lithography.

Process latitude comparison of advanced DUV photoresists to latest-generation 193-nm photoresists

Michael T. Reilly, Christiane Jehoul, Lori Anne Joesten, 2001, SPIE Advanced Lithography.

Novel analysis technique for examining the effect of exposure conditions on the mask error enhancement factor

Michael T. Reilly, Stewart A. Robertson, Colin R. Parker, 2001, Microelectronic and MEMS Technologies.

Advances in vortex via fabrication

Yasutaka Morikawa, Naoya Hayashi, Martin E. Mastovich, 2004, SPIE Advanced Lithography.

Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes

Michael T. Reilly, Doris Kang, Stewart A. Robertson, 2001, SPIE Advanced Lithography.

SPR dispersion compensation for a gold-coated corrugated surface

Michael T. Reilly, Marsela Jorgolli, Peter A. Nessing, 2006, SPIE BiOS.

Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks

Michael T. Reilly, Robert John Socha, Mircea Dusa, 2000, Advanced Lithography.

Method of ellipsometric characterization of the resist and DBARC interface

Michael T. Reilly, James F. Cameron, Adam Ware, 2011, Advanced Lithography.

Negative tone 193-nm photoresists

Michael T. Reilly, George G. Barclay, Patrick J. Bolton, 2003, SPIE Advanced Lithography.