Kathirgamasundaram Sooriakumar

Investigation of in situ trench etching process and Bosch process for fabricating high-aspect-ratio beams for microelectromechanical systems

W. Yoo, J. S. Pan, K. Kok, 2002 .

Fabrication of MEMS-based capacitive silicon microphone structure with staircase contour cavity using multi-film thickness mask

S. Niemcharoen, N. Atthi, W. Jeamsaksiri, 2019, Microelectronic Engineering.

In situ trench etching and releasing technique of high aspect ratio beams using magnetically enhanced reactive ion etching

Won Jong Yoo, W. Yoo, K. Kok, 2002 .