Maya Doytcheva

Toward 7nm target on product overlay for C028 FDSOI technology

Jan Beltman, Maxime Gatefait, Bertrand Le-Gratiet, 2013, Advanced Lithography.

Advances in process overlay: alignment solutions for future technology nodes

Hyun-Woo Lee, Richard van Haren, Maya Doytcheva, 2007, SPIE Advanced Lithography.

In situ transmission electron microscopy investigation of the structural changes in carbon nanotubes during electron emission at high currents

Maya Doytcheva, Monja Kaiser, M. Kaiser, 2006 .