M. T. Allen

A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

Kenneth D. M. Harris, Richard E. Palmer, Alex P. G. Robinson, 2000 .

Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography

Kenneth D. M. Harris, Richard E. Palmer, Alex P. G. Robinson, 2000 .

10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist

Kenneth D. M. Harris, Richard E. Palmer, Alex P. G. Robinson, 1999 .