Takeshi Ohta

Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source

Takashi Suganuma, Masato Moriya, Junichi Fujimoto, 2011, Advanced Lithography.

Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography

T. Abe, H. Mizoguchi, J. Fujimoto, 2012 .

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2016, Advanced Lithography.

The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2016, Advanced Lithography.

Output stabilization technology with chemical impurity control on ArF excimer laser

Hakaru Mizoguchi, Akira Sumitani, Natsushi Suzuki, 2000, Advanced Lithography.

Development of a Shape Meter Employing the LED Dot Pattern Projection Method for a Hot Strip Finishing Mill

Takeshi Ohta, Y. Isei, Tomoya Kato, 2020, ISIJ International.