A. Pawloski

发表

Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities

Adam R. Pawloski, Martin J. Goldberg, Glenn H. McGall, 2007 .

Progress in 193-nm top-surface imaging process development

David R. Wheeler, Guojing Zhang, John M. Hutchinson, 1998, Advanced Lithography.

Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

Harry J. Levinson, Bruno La Fontaine, Yuansheng Ma, 2007, SPIE Advanced Lithography.

A Standard Addition Technique To Quantify Photoacid Generation in Chemically Amplified Photoresist

Adam R. Pawloski, Paul F. Nealey, P. Nealey, 2001 .

Changes of free energy in the process of discontinuous precipitation in deformed FCC solid solution

A. Pawloski, 1979 .

Mapping Targetable Sites on Human Telomerase RNA Pseudoknot/Template Domain Using 2′-OMe RNA-interacting Polynucleotide (RIPtide) Microarrays*

Peter S. Kutchukian, G. Mcgall, G. Verdine, 2012, The Journal of Biological Chemistry.

Efficiency of Photoacid Generators in Chemically Amplified Resists for 157nm Lithography

P. Nealey, W. Conley, A. Pawloski, 2002 .

Applications of molecular modeling in nanolithography

Adam R. Pawloski, Paul F. Nealey, P. Nealey, 1999 .

Measuring acid generation efficiency in chemically amplified resists with all three beams

Hans Loeschner, Robert L. Brainard, Rainer Kaesmaier, 1999 .

Characterization of line-edge roughness in photoresist using an image fading technique

Bruno M. La Fontaine, Harry J. Levinson, Adam R. Pawloski, 2004, SPIE Advanced Lithography.