Kazuya Takada

Influence of sputtering parameters on the crystallinity and crystal orientation of AlN layers deposited by RF sputtering using the AlN target

Hiroyuki Fukuyama, Hidekazu Kobatake, Makoto Ohtsuka, 2009 .

Influence of sputter power and N2 gas flow ratio on crystalline quality of AlN layers deposited at 823 K by RF reactive sputtering

Hiroyuki Fukuyama, Makoto Ohtsuka, Kazuya Takada, 2012 .

Al- and N-polar AlN layers grown on c-plane sapphire substrates by modified flow-modulation MOCVD

Toru Kinoshita, Koji Kawasaki, Yoshinao Kumagai, 2007 .

Polarity dependence of AlN {0001} decomposition in flowing H2

Toru Kinoshita, Yoshinao Kumagai, Hisashi Murakami, 2007 .