Keisuke Nakamura

Selective Etching of High-k Dielectric HfO2 Films over Si in BCl3-Containing Plasmas without rf Biasing

Koji Eriguchi, Kouichi Ono, Daisuke Hamada, 2009 .

Plasma etching of high-k and metal gate materials

Kouichi Ono, Kazuo Takahashi, K. Ono, 2006 .