Tsutomu Tawa

The Effect of Condenser Tilt on Optical Projection Lithography

Tsuneo Terasawa, Souichi Katagiri, Katsunobu Hama, 1991 .

Pattern dependent alignment technique for mix-and-match electron-beam lithography with optical lithography

Norio Hasegawa, Katsuya Hayano, Yasuko Gotoh, 1998 .

Evaluation of Pupil-Filtering in High-Numerical Aperture I-Line Lens

Hiroshi Fukuda, Shinji Okazaki, Kobayashi Yasushi, 1993 .