Shohei Yamauchi

发表

CD error budget analysis for self-aligned multiple patterning

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2012, Other Conferences.

Pattern fidelity in multiple-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2014, Advanced Lithography.

Robust complementary technique with multiple-patterning for sub-10 nm node device

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2014, Advanced Lithography.

Process variability of self-aligned multiple patterning

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2013, Advanced Lithography.

Contact/Via placement management for N7 logic and beyond

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2016, SPIE Advanced Lithography.

Considerations for pattern placement error correction toward 5nm node

Carlos Fonseca, Hidetami Yaegashi, Kenichi Oyama, 2017, Advanced Lithography.

Novel approaches to implement the self-aligned spacer double-patterning process toward 11-nm node and beyond

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2011, Advanced Lithography.

The important challenge to extend spacer DP process towards 22nm and beyond

Hiroki Murakami, Hidetami Yaegashi, Kenichi Oyama, 2010, Advanced Lithography.

Considerations for fine hole patterning for the 7nm node

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2016, SPIE Advanced Lithography.

Recent progress on multiple-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2014, Advanced Lithography.

Sustainable scaling technique on double-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2013, Advanced Lithography.

Recent progress on multipatterning: approach to pattern placement correction

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2015, Advanced Lithography.

Innovative solutions on 193 immersion-based self-aligned multiple patterning

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2014, Advanced Lithography.

Enabling capability of multi-patterning towards 10nm and beyond

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2015, 2015 China Semiconductor Technology International Conference.

Overview: continuous evolution on double-patterning process

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2012, Other Conferences.

The enhanced photoresist shrink process technique toward 22nm node

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2011, Advanced Lithography.

Complementary patterning demonstration with e-beam direct writer and spacer DP process of 11nm node

Kenichi Oyama, Shohei Yamauchi, Akio Yamada, 2012, Advanced Lithography.

7nm logic optical lithography with OPC-Lite

Hidetami Yaegashi, Kenichi Oyama, Valery Axelrad, 2015, Advanced Lithography.

Applicability of double-patterning process for fine-hole patterns

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2012, Other Conferences.

Sustainability and applicability of spacer-related patterning towards 7nm node

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2015, Advanced Lithography.

CD bias control on hole pattern

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2016, SPIE Advanced Lithography.

Process requirement of self-aligned multiple patterning

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2013, Advanced Lithography.

Invited) Important Challenges in Double Patterning Processes

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2013 .

High-etching selectivity of spin-on-carbon hard mask process for 22nm node and beyond

Satoru Shimura, Hidetami Yaegashi, Kenichi Oyama, 2012, Other Conferences.

Noble approaches on double-patterning process toward sub-15nm

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2013, Advanced Lithography.

Extendibility of self-aligned type multiple patterning for further scaling

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2013, Advanced Lithography.

Advanced multi-patterning using resist core spacer process for 22nm node and beyond

Satoru Shimura, Hidetami Yaegashi, Kenichi Oyama, 2012, Other Conferences.

Optimize of shrink process with X-Y CD bias on hole pattern

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2017, Advanced Lithography.

Photoresist performance modification through plasma treatment

Hidetami Yaegashi, Kenichi Oyama, Arisa Hara, 2015, Advanced Lithography.

(Invited) Optical Lithography Extension Technique with Multiple-Patterning Process

Hidetami Yaegashi, Arisa Hara, Sakurako Natori, 2014 .