R. De Gryse

发表

Understanding the discharge voltage behavior during reactive sputtering of oxides

Johan Haemers, D. Depla, R. D. Gryse, 2007 .

Towards a more complete model for reactive magnetron sputtering

D. Depla, S. Mahieu, Diederik Depla, 2007 .

DC magnetron sputter deposited vanadia catalysts for oxidation processes

Dirk Poelman, Guy Marin, Bert F. Sels, 2007 .

Modeling of the target surface modification by reactive ion implantation during magnetron sputtering

Renaat Gijbels, Annemie Bogaerts, Z. Y. Chen, 2004 .

Thirty years of rotatable magnetrons

Wouter Leroy, Johan Haemers, Diederik Depla, 2012 .

Maximum likelihood common factor analysis in Auger electron spectroscopy

P. D. Volder, R. Hoogewijs, R. D. Gryse, 1991 .

Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation

G. Buyle, Jan Musschoot, Johan Haemers, 2006 .