Mark P. Stoykovich
发表
Shuodao Wang,
John A. Rogers,
Yonggang Huang,
2009
.
Paul F. Nealey,
Mark P. Stoykovich,
2017
.
The use of surfactant in the rinse to improve collapse behavior of chemically amplified photoresists
Mark P. Stoykovich,
Paul F. Nealey,
Ivan Junarsa,
2004,
SPIE Advanced Lithography.
Mark P. Stoykovich,
M. P. Stoykovich,
J. Kaar,
2014,
Journal of the American Chemical Society.
E. W. Edwards,
Mark P. Stoykovich,
Harun H. Solak,
2006
.
Juan J. de Pablo,
Marcus Müller,
Mark P. Stoykovich,
2010
.
Leonidas E. Ocola,
Heidi B. Cao,
Mark P. Stoykovich,
2003
.
Mark P. Stoykovich,
Aaron E. Saunders,
M. P. Stoykovich,
2011
.
Dapeng Wang,
Junxiao Yang,
Mark P. Stoykovich,
2018,
Advanced materials.
Mark P. Stoykovich,
Paul F. Nealey,
P. Nealey,
2007
.
Mark P. Stoykovich,
Harun H. Solak,
Bong Hoon Kim,
2006
.
Mark P. Stoykovich,
Paul F. Nealey,
Kenji Yoshimoto,
2007
.
Mark P. Stoykovich,
Soichi Hirokawa,
M. P. Stoykovich,
2013
.
John A. Rogers,
Yonggang Huang,
Jianliang Xiao,
2009
.
John A. Rogers,
Yonggang Huang,
Jianliang Xiao,
2009
.
Yasin Ekinci,
Mark P. Stoykovich,
Harun H. Solak,
2007
.
Mark P. Stoykovich,
J. L. Feaver,
M. P. Stoykovich,
2012
.
Juan J. de Pablo,
E. W. Edwards,
Marcus Müller,
2007
.