Guenther Seitz

发表

Final Report for Lith 112 High-NA Optics for the Micro-Exposure Tool (MET)

Regina Soufli, Donald W. Phillion, Russell M. Hudyma, 2001 .

Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography

Markus Rupp, Guenther Seitz, Frank Eisert, 2004, SPIE Optics + Photonics.

Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology

Guenther Seitz, Frank Eisert, Martin Weiser, 2000, SPIE Optics + Photonics.

Resolution limits of active triangulation systems by defocusing

Hans J. Tiziani, Guenther Seitz, 1993 .