H. Sato

Local mechanical-stress control (LMC): a new technique for CMOS-performance enhancement

H. Ohta, K. Hachimine, A. Shimizu, 2001, International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224).

A highly dense, high-performance 130 nm node CMOS technology for large scale system-on-a-chip applications

T. Ando, S. Wada, S. Wakahara, 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

Accurate statistical process variation analysis for 0.25-/spl mu/m CMOS with advanced TCAD methodology

H. Masuda, K. Tsuneno, H. Kunitomo, 1998 .

Rigorous statistical process variation analysis for quarter-/spl mu/m CMOS with advanced TCAD metrology

H. Masuda, Katsumi Tsuneno, H. Sato, 1997, 1997 2nd International Workshop on Statistical Metrology.

A new defect distribution metrology with a consistent discrete exponential formula and its applications

H. Masuda, H. Sato, A. Sugimoto, 1998, IWSM. 1998 3rd International Workshop on Statistical Metrology (Cat. No.98EX113).

Discrimination of clustered defects on wafers using statistical methods

H. Sato, M. Ikota, J. Taguchi, 1997, 1997 2nd International Workshop on Statistical Metrology.

Applied TCAD in Mega-Bits Memory Design

Masayuki Nakamura, H. Sato, H. Masuda, 1993 .