M. Karunaratne

Effect of Fluorine Implantation Dose on Boron Transient Enhanced Diffusion and Boron Thermal Diffusion in Si 1 x Ge x

P. Ashburn, A. Willoughby, J. Bonar, 2005 .

Diffusion and activation of dopants in silicon and advanced silicon-based materials

P. Pichler, A. Claverie, N. Cowern, 2006 .

Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si/sub 1-x/Ge/sub x/

P. Ashburn, Y. Wang, P.L.F. Hemment, 2005, IEEE Transactions on Electron Devices.

Effect of fluorine implantation dose on boron thermal diffusion in silicon

Peter Ashburn, Jing Zhang, Y. Wang, 2004 .

Analysis of Alterations in Matrix Quality at Nanoscale in Metabolic Bone Diseases using Synchrotron X-ray Diffraction.

M. Karunaratne, 2013 .

Suppression of boron diffusion due to carbon during rapid thermal annealing of SiGe based device materials—some comments

P. Ashburn, J. Bonar, A. Willoughby, 2006 .

Effect of point defect injection on diffusion of boron in silicon and silicon-germanium in the presence of carbon

P. Ashburn, A. Willoughby, J. Bonar, 2005 .