M. Yousif

Process optimization for SiGe pMOSFETs using low temperature oxides on ultra-thin cap layers

P. Lundgren, S. Bengtsson, M. Johansson, 2004 .

Short-channel effects in Si/Si1−xGex retrograde double quantum well p-MOSFETs

O. Nur, M. Willander, M. Yousif, 1999 .

Threshold voltage and charge control considerations in double quantum wellSi/Si1−xGex p-type MOSFETs

O. Nur, M. Willander, Yifeng Fu, 1998 .

Analysis of retrograded double quantum well p-type MOSFET

O. Nur, M. Willander, M. Yousif, 1998 .

Direct assessment of relaxation and defect propagation in different as-grown and in situ post-growth annealed thin Ge/Si and step-graded Si1−xGex/Si buffer layers

Y. Campidelli, D. Bensahel, O. Nur, 2001 .

CMOS considerations in nanoelectromechanical carbon nanotube-based switches

P. Enoksson, P. Lundgren, S. Bengtsson, 2008, Nanotechnology.

HfO2 gate dielectrics on strained-Si and strained-SiGe layers

Mikael Johansson, Stefan Bengtsson, Per Lundgren, 2003 .