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Impact of sub-melt laser annealing on Si1-xGex source /drain defectivity

A. Hikavyy, E. Rosseel, O. Richard, 2007, 2007 15th International Conference on Advanced Thermal Processing of Semiconductors.

Dynamic surface anneal: activation without diffusion

T. Trowbridge, Haifan Liang, R. Mcintosh, 2004, 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004..

SiGe-base PNP transistors fabricated with n-type UHV/CVD LTE in a `No Dt' process

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