H. Shin

发表

Thermal Immune Ni Germanide for High Performance Ge MOSFETs on Ge -on- Si Substrate Utilizing $ \hbox{Ni}_{0.95}\hbox{Pd}_{0.05}$ Alloy

Won-Ho Choi, R. Jammy, Zhun Zhong, 2009 .

Novel Ni silicide formed with a Ni/Er/Ni/TiN structure for thermal stable and low contact resistance source/drain in MOSFETs

H. Lee, Ga-Won Lee, M. Li, 2014 .

Thermally Robust Ni Germanide Technology Using Cosputtering of Ni and Pt for High-Performance Nanoscale Ge MOSFETs

H. Lee, Ga-Won Lee, Min-Ho Kang, 2012, IEEE Transactions on Nanotechnology.

Improvement of Thermal Stability of Ni-Germanide with Ni/Co/Ni/TiN Structure for High Performance Ge Metal–Oxide–Semiconductor Field Effect Transistors

H. Lee, Ga-Won Lee, Min-Ho Kang, 2012 .

Improvement of thermal stability of Ni-germanide with co-sputtering of nickel and palladium for high performance Ge CMOSFET

H. Lee, Min-Ho Kang, Jungwoo Oh, 2011, 2011 International Semiconductor Device Research Symposium (ISDRS).

Ni Germanide Utilizing Ytterbium Interlayer for High-Performance Ge MOSFETs

H. Lee, Ga-Won Lee, Jungwoo Oh, 2009 .

Influence of Incorporating Rare Earth Metals on the Schottky Barrier Height of Ni Silicide

H. Lee, Jungwoo Oh, P. Majhi, 2010 .

Isotherm, kinetic and thermodynamic characteristics of adsorption of paclitaxel onto Diaion HP-20

Jin-Hyun Kim, H. Shin, 2016 .

Interface Treatment Effect of High Performance Flexible Organic Thin Film Transistor (OTFT) Using PVP Gate Dielectric in Low Temperature

H. Yun, H. Lee, Ga-Won Lee, 2011 .

Process Temperature Dependence of Al2O3 Film Deposited by Thermal ALD as a Passivation Layer for c-Si Solar Cells

K. Jeong, H. Lee, Ga-Won Lee, 2013 .

A Novel Atomic Layer Deposited Al2O3Film with Diluted NH4OH for High-Efficient c-Si Solar Cell

K. Jeong, H. Lee, Ga-Won Lee, 2014 .

Electrical, Structural and Optical Characteristic Analysis of Al-doped ZnO Film Deposited by Atomic Layer Deposition

Yu-Mi Kim, K. Jeong, H. Yun, 2011 .

Effects of hydrogen on the magnetic properties of TiZrNi quasicrystals

Sang-hwa Lee, Jae-yong Kim, H. Shin, 2012 .

Microstructural Innovation of Ni Germanide on Ge-on-Si Substrate by Using Palladium Incorporation

H. Lee, Ga-Won Lee, Chel-Jong Choi, 2009 .

Study on palladium germanide on Ge-on-Si substrate for nanoscale Ge channel Schottky barrier MOSFETs

H. Lee, Ga-Won Lee, Ying-Ying Zhang, 2010, 2010 International Workshop on Junction Technology Extended Abstracts.

Blistering Induced Degradation of Thermal Stability Al2O3Passivation Layer in Crystal Si Solar Cells

K. Jeong, H. Lee, Ga-Won Lee, 2014 .

Improvement of Thermal Stability of Nickel Silicide Using Co-sputtering of Ni and Ti for Nano-Scale CMOS Technology

Meng Li, Hi-Deok Lee, H. Lee, 2013 .

Novel silicon surface passivation by Al2O3/ZnO/Al2O3 films deposited by thermal atomic layer deposition

Ga-Won Lee, Ho-Jin Yun, Kwang-Seok Jeong, 2014 .

Improvement of Thermal Stability of Nickel Silicide Using Co-Sputtering of Ni and Ti on Boron Cluster Implanted Ultra-Shallow Junction for Nanoscale CMOS Technology

H. Lee, M. Li, H. Shin, 2013 .

Tuning Schottky barrier height of Ni germanide for high performance nano-scale Ge MOSFETs application

H. Lee, Ying-Ying Zhang, I. Han, 2010 .

Improvement of Thermal Stability of Ni-Silicide Using Vacuum Annealing on Boron Cluster Implanted Ultra Shallow Source/Drain for Nano-Scale CMOSFETs

Ga-Won Lee, Min-Ho Kang, Se-Kyung Oh, 2010 .

Improvement of junction characteristics of ultra shallow junction with boron-cluster implantation and Ni-silicide for nano-scale CMOS technology

H. Lee, Ga-Won Lee, Min-Ho Kang, 2010, 2010 Silicon Nanoelectronics Workshop.

Conduction Mechanism and Reliability Characteristics of a Metal–Insulator–Metal Capacitor with Single ZrO2 Layer

H. Lee, Ga-Won Lee, C. Kang, 2011 .