Jae W. Hahn

发表

Development of optical inspection system for detecting malfunctions of digital micromirror device

Minwook Kang, Dong Won Kang, Wondong Lee, 2015, International Seminar on Photonics, Optics, and its Applications.

Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography

Minwook Kang, Dong Won Kang, Jae W. Hahn, 2013 .

High throughput plasmonic lithography for sub 50nm patterning with a contact probe

Jae W. Hahn, Howon Jung, Yongwoo Kim, 2010, Advanced Lithography.

Time-resolved absolute spectral analysis of IR countermeasure flares and its experimental validation by using an optical emission spectrometer with PbSe array detector

Hyungwoo Lee, Jae W. Hahn, Changhoon Oh, 2012, Defense, Security, and Sensing.

An infrared metamaterial selective absorber with emitter considering atmospheric absorption for low observability (Conference Presentation)

Jae W. Hahn, Jagyeong Kim, Kiwook Han, 2016, Optical Engineering + Applications.

A mid-IR optical emission spectrometer with a PbSe array detector for analyzing spectral characteristic of IR flares

Minwook Kang, Wondong Lee, Jae W. Hahn, 2015, International Seminar on Photonics, Optics, and its Applications.

High-resolution laser direct writing with a plasmonic contact probe

Jae W. Hahn, Howon Jung, Jinhee Jang, 2012, Advanced Lithography.

Nano patterning with a single high-transmission nano-metal aperture system

Jae W. Hahn, Sinjeung Park, Eungman Lee, 2008, SPIE Advanced Lithography.

Temporal and spectral analysis of laser induced plasma in the ablation process of flexible printed circuit board

Jae W. Hahn, Seok Jin Kim, Hoon Chul Ryoo, 2008, SPIE LASE.

Spectrally investigated optimization for high optical transmission of the C-shaped nano apertures

Kyoungsik Kim, Jae W. Hahn, Eungman Lee, 2007, SPIE Advanced Lithography.

Improvement of photomask CD uniformity using spatially resolved optical emission spectroscopy

Young-Keun Kim, Byung-Gook Kim, Chan-Uk Jeon, 2016, Photomask Technology.

Minimum energy of silver and copper nanoparticles for laser sintering (Conference Presentation)

Jae W. Hahn, Changmin Lee, 2016, NanoScience + Engineering.

Calibration of a mid-IR optical emission spectrometer with a 256-array PbSe detector and an absolute spectral analysis of IR signatures

Jae W. Hahn, Changhoon Oh, J. Hahn, 2013 .

Analysis of the line pattern width and exposure efficiency in maskless lithography using a digital micromirror device

Jae W. Hahn, Dong Won Kang, Hoonchul Ryoo, 2011 .

Selective dual-band metamaterial perfect absorber for infrared stealth technology

Jae W. Hahn, Kiwook Han, J. Hahn, 2017, Scientific Reports.

Relative positioning method for near-field beam spot array with optical microscope image of lithographic patterns using linear regression

Jae W. Hahn, J. Hahn, Jinhee Jang, 2017 .

Model-based breakdown of resist and mask contributions to local CDU for sub-30-nm contact holes in EUV lithography

Insung Kim, Yeo Jeongho, Jae W. Hahn, 2014 .

Experimental analysis of pattern line width in digital maskless lithography

Jae W. Hahn, Dong Won Kang, Yo-Tak Song, 2012 .

Analysis of the effective reflectance of digital micromirror devices and process parameters for maskless photolithography

Jae W. Hahn, Dong Won Kang, J. Hahn, 2011 .