Bo Peng

Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging.

Qiongyan Yuan, Zicheng Qiu, Xiangzhao Wang, 2010, Optics letters.

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations.

Lifeng Duan, Qiongyan Yuan, Zicheng Qiu, 2009, Applied optics.

Measurement technique for characterizing odd aberration of lithographic projection optics based on dipole illumination

Qiongyan Yuan, Zicheng Qiu, Xiangzhao Wang, 2010 .