T. Morimoto

发表

Planar Interconnection Technology for LSI Fabrication Utilizing Lift‐off Process

S. Matsuo, K. Ehara, T. Morimoto, 1984 .

H2 dilution effect in the Cat-CVD processes of the SiH4/NH3 system

A. Masuda, A. Izumi, H. Umemoto, 2006 .

Catalytic CVD processes of oxidizing species and the prevention of oxidization of heated tungsten filaments by H2

H. Umemoto, H. Matsumura, S. Ansari, 2008 .

Radical Species Formed by the Catalytic Decomposition of NH3 on Heated W Surfaces

A. Masuda, H. Umemoto, Kentaro Ohara, 2003 .

Deposition chemistry in the Cat-CVD processes of the SiH4/NH3 system

A. Masuda, H. Umemoto, H. Matsumura, 2003 .

Technique for the production, preservation, and transportation of H atoms in metal chambers for processings

A. Masuda, H. Umemoto, K. Ishibashi, 2005 .

Quantification of Gas-Phase H-Atom Number Density by Tungsten Phosphate Glass

A. Masuda, H. Kawazoe, H. Umemoto, 2005 .

Mass-Spectrometric Studies of Catalytic Chemical Vapor Deposition Processes of Organic Silicon Compounds Containing Nitrogen

A. Masuda, H. Umemoto, Megumi Nakamura, 2006 .

Calorimetric Study on Precipitation in Cu–Be Alloys

H. Tsubakino, A. Yamamoto, T. Morimoto, 1993 .

Catalytic decomposition of HCN on heated W surfaces to produce CN radicals

A. Masuda, H. Umemoto, H. Matsumura, 2004 .