Jacques Beauvais

Fabrication of a 3D nano-imprint template with a conformal dry vapor deposited electron beam resist

Jacques Beauvais, Eric Lavallee, Andrew Zanzal, 2005, SPIE Advanced Lithography.

Plasma deposited and evaporated thin resists for template fabrication

Jacques Beauvais, Dominique Drouin, Eric Lavallée, 2006, European Mask and Lithography Conference.

Resistless electron beam lithography technique for the fabrication of x-ray masks

Jacques Beauvais, Eric Lavallee, Dominique Drouin, 2001, European Mask and Lithography Conference.

Resist sensitivity and thickness-based beam count optimization for parallel low energy E-beam exposure systems

Jacques Beauvais, Eric Lavallee, Andrew Zanzal, 2005, SPIE Advanced Lithography.

Evaporated resist for the fabrication and replication of LEEPL mask

Jacques Beauvais, Eric Lavallee, Dominique Drouin, 2004, SPIE Advanced Lithography.

Nanopatterning on fragile or 3D surfaces with sterol-based vapor-deposited electron beam resist

Jacques Beauvais, Eric Lavallee, Dominique Drouin, 2004, SPIE Advanced Lithography.

Carbon nanotubes (CNTs) based strain sensors for a wearable monitoring and biofeedback system for pressure ulcer prevention and rehabilitation

Jacques Beauvais, Patrick Boissy, Jean-Pierre Béland, 2011, 2011 Annual International Conference of the IEEE Engineering in Medicine and Biology Society.