Y. Le

Amorphous Indium Tin Oxide Thin-Film Transistors Fabricated by Cosputtering Technique

Yang Shao, Shengdong Zhang, Letao Zhang, 2016, IEEE Transactions on Electron Devices.

Method of increasing gate nitridation and its impact on CMOS devices

V. Gopinath, A. Kamath, Y. Le, 2003, Extended Abstracts of International Workshop on Gate Insulator (IEEE Cat. No.03EX765).

Impact of the interaction between nitrogen implant and NO anneal on narrow-width transistors

V. Gopinath, A. Kamath, Y. Le, 2003, IEEE Electron Device Letters.

Indium–Tin–Oxide Thin-Film Transistors With In Situ Anodized Ta 2 O 5 Passivation Layer

Xiang Xiao, Yang Shao, Shengdong Zhang, 2016 .

Indium–Tin–Oxide Thin-Film Transistors With In Situ Anodized Ta2O5 Passivation Layer

Xiang Xiao, Yang Shao, Shengdong Zhang, 2016, IEEE Electron Device Letters.