Xiao Zou

Optical and electrical characterization of α-InGaZnO thin film fabricated by pulsed laser deposition for thin film transistor applications

Sheng Xu, Xingzhong Zhao, Huihui Huang, 2009 .

High-Performance Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors With {HfO}_{x}{N}_{y}/{HfO}_{2}/{HfO}_{x}{N}_{y} Tristack Gate Dielectrics

Xingzhong Zhao, G. Fang, Longyan Yuan, 2011 .

Damage-free mica/MoS2 interface for high-performance multilayer MoS2 field-effect transistors

P. Lai, Wing-Man Tang, J. Xu, 2019, Nanotechnology.

Top-Gate Low-Threshold Voltage $p\hbox{-}\hbox{Cu}_{2} \hbox{O}$ Thin-Film Transistor Grown on $\hbox{SiO}_{2}/ \hbox{Si}$ Substrate Using a High-$\kappa$ HfON Gate Dielectric

Meiya Li, Xingzhong Zhao, G. Fang, 2010, IEEE Electron Device Letters.

Electrical characteristics of Al-doped ZnO-channel thin-film transistor with high-κ HfON/SiO2 stack gate dielectric

P. Lai, J. Xu, Xiao Zou, 2010, 2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC).

Improved Subthreshold Swing and Gate-Bias Stressing Stability of p-Type $\hbox{Cu}_{2}\hbox{O}$ Thin-Film Transistors Using a $\hbox{HfO}_{2}$ High- $k$ Gate Dielectric Grown on a $\hbox{SiO}_{2}/\hbox{Si}$ Substrate by Pulsed Laser Ablation

Xingzhong Zhao, G. Fang, Jiawei Wan, 2011, IEEE Transactions on Electron Devices.

Study on the interface properties and reliability of the electric-double-layer gate dielectric for Hf-In-Zn-O MIS capacitors

Xiao Zou, Hongjiu Wang, Yao Li, 2013, Proceedings of the 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA).

Improved interface properties and reliability for Hf-In-Zn-O semiconductor capacitors with an electric-double-layer gate dielectric by inserting a HfO2 interlayer

G. Fang, H. Long, Haoning Wang, 2013 .