S. Tedesco

发表

Magnetic properties of Co/Pt multilayers deposited on patterned Si substrates

B. Diény, B. Rodmacq, M. Heitzmann, 2001 .

Domain structure of magnetic layers deposited on patterned silicon

B. Diény, B. Rodmacq, M. Heitzmann, 1999 .

PRIME process for deep UV and e-beam lithography

T. Mourier, M. Lerme, F. Vinet, 1990 .

Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weight

L. Pain, C. Gourgon, B. Dal'zotto, 2000 .

HSQ hybrid lithography for 20 nm CMOS devices development

G. Cunge, J. Foucher, B. Dal'zotto, 2002 .

Direct write lithography: the global solution for R&D and manufacturing

Laurent Pain, Christophe Constancias, Serge V. Tedesco, 2006 .

Resist processes for hybrid (electron-beam/deep ultraviolet) lithography

P. Paniez, T. Mourier, B. Mortini, 1998 .

Measuring acid generation efficiency in chemically amplified resists with all three beams

Hans Loeschner, Robert L. Brainard, Rainer Kaesmaier, 1999 .

Positive resist image by dry etching: New dry developed positive working system for electron beam and deep ultraviolet lithography

Christophe Pierrat, Francoise Vinet, M. Lerme, 1989 .

Realization of two-dimensional optical devices using photonic band gap structures on silicon-on-insulator

Xavier Letartre, Emmanuel Picard, Pedro Rojo-Romeo, 2002 .