George Kokkoris

发表

Line edge roughness transfer during plasma etching: modeling approaches and comparison with experimental results

Evangelos Gogolides, Vassilios Constantoudis, Erwine Pargon, 2009, Advanced Lithography.

Is the resist sidewall after development isotropic or anisotropic? effects of resist sidewall morphology on LER reduction and transfer during etching

Evangelos Gogolides, Vassilios Constantoudis, Erwine Pargon, 2010, Advanced Lithography.

Three-dimensional geometrical modeling of plasma transfer effects on line edge roughness: comparison with experiments and rules of thumb

Evangelos Gogolides, Vassilios Constantoudis, George Kokkoris, 2013 .

3d modeling of LER transfer from the resist to the underlying substrate: the effect of the resist roughness

Evangelos Gogolides, George Kokkoris, V. Constantoudis, 2012, Advanced Lithography.

Towards an integrated line edge roughness understanding: metrology, characterization, and plasma etching transfer

Evangelos Gogolides, Vassilios Constantoudis, George Kokkoris, 2013, Advanced Lithography.

Line-edge-roughness transfer during plasma etching: modeling approaches and comparison with experimental results

Evangelos Gogolides, Vassilios Constantoudis, Erwine Pargon, 2009 .

Plasma Etching of Poly(dimethylsiloxane): Roughness Formation, Mechanism, Control, and Application in the Fabrication of Microfluidic Structures

Angeliki Tserepi, Evangelos Gogolides, George Kokkoris, 2013 .

A labyrinth split and merge micromixer for bioanalytical applications

Angeliki Tserepi, George Papadakis, George Kokkoris, 2015 .

Stochastic simulation studies of molecular resists for the 32nm technology node

Evangelos Gogolides, Andreas G. Boudouvis, Ioannis Raptis, 2008 .

A passive micromixer for enzymatic digestion of DNA

Angeliki Tserepi, Georgia Kaprou, Despina Moschou, 2014 .

Integrated biochip for PCR-based DNA amplification and detection on capacitive biosensors

Ioanna Zergioti, Stavros Chatzandroulis, Despina Moschou, 2013, Microtechnologies for the New Millennium.

Etching of SiO2 features in fluorocarbon plasmas: Explanation and prediction of gas-phase-composition effects on aspect ratio dependent phenomena in trenches

Evangelos Gogolides, Andreas G. Boudouvis, George Kokkoris, 2002 .

Modeling of Charging on Unconventional Surface Morphologies of PMMA Substrates During Ar Plasma Etching

George Kokkoris, G. Kokkoris, George Memos, 2016 .

All-plastic, low-power, disposable, continuous-flow PCR chip with integrated microheaters for rapid DNA amplification

Angeliki Tserepi, George Papadakis, Stavros Chatzandroulis, 2014 .

Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Dimitrios Kontziampasis, Angeliki Tserepi, Evangelos Gogolides, 2011 .

A continuous flow μPCR device with integrated microheaters on a flexible polyimide substrate

Angeliki Tserepi, Stavros Chatzandroulis, Despina Moschou, 2011 .