J. Ishikawa

H. Tsuji, Y. Gotoh, J. Ishikawa, 2000, 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).

Neuron cell positioning on polystyrene in culture by silver-negative ion implantation and region control of neural outgrowth

H. Tsuji, Y. Gotoh, J. Ishikawa, 2000 .

A negative ion beam application to artificial formation of neuron network in culture

H. Tsuji, Y. Gotoh, J. Ishikawa, 2000 .

The charging mechanism of insulated electrode in negative-ion implantation

H. Tsuji, S. Sakai, Y. Gotoh, 1995 .

Dependence of emission characteristics of Spindt-type field emitters on cathode material

K. Utsumi, H. Tsuji, M. Nagao, 1999 .

Crystallographic structure and composition of vanadium nitride films deposited by direct sputtering of a compound target

H. Tsuji, M. Liao, Y. Gotoh, 2004 .

Focused ion beam direct deposition of superconductive thin film

Masahiro Ueda, Hiromasa Maruno, Yoichi Fujiyama, 1994 .

Thermal diffusion behavior of implanted germanium atoms in silicon dioxide film measured by high-resolution RBS

H. Tsuji, H. Kotaki, T. Ishibashi, 2007 .

Low Temperature Oxide and Nitride Film Depositions by Simultaneous Use of Ionized Cluster Beam Source and Microwave Ion Source

T. Takagi, G. Takaoka, J. Ishikawa, 1987 .

Emission characteristics of ZrN thin film field emitter array fabricated by ion beam assisted deposition technique

H. Tsuji, M. Nagao, Y. Gotoh, 1998 .

Irradiation effect of carbon negative-ion implantation on polytetrafluoroethylene for controlling cell-adhesion property

H. Kojima, H. Tsuji, G. Takaoka, 2010 .

Study on emission yields of negative- and positive-ion induced secondary electron from thin SiO2 film

H. Tsuji, Y. Gotoh, J. Ishikawa, 1997 .

Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials

H. Tsuji, Y. Gotoh, J. Ishikawa, 1996 .

Emission stability analysis of cone-shaped metal-insulator-semiconductor cathode by Monte Carlo simulation

H. Tsuji, M. Nagao, Y. Gotoh, 1998, 10th International Conference on Vacuum Microelectronics.

Negative-ion source applications.

J. Ishikawa, 2008, Review of Scientific Instruments.

Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beads

S. Kido, H. Tsuji, H. Sasaki, 2000 .

Negative-ion implanter for powders and uniform implantation without particle scattering

J. Ishikawa, Y. Gotoh, M. Mimura, 1998, 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).

Low temperature formation of silicon nitride and oxide films by the simultaneous use of a microwave ion source and an ICB source

K. Matsugatani, G. Takaoka, J. Ishikawa, 1989 .

Relationship between work function and current fluctuation of field emitters: Use of SK chart for evaluation of work function

H. Tsuji, Y. Gotoh, J. Ishikawa, 2001 .

Measurement of heavy negative ion production probabilities by sputtering

H. Tsuji, Y. Gotoh, J. Ishikawa, 2008 .

Nanoparticle formation in 25-nm-SiO2 thin layer by germanium negative-ion implantation and its capacitance–voltage characteristics

H. Tsuji, H. Kotaki, T. Ishibashi, 2007 .

Secondary electron emission and surface potential of SiO2 film surface by negative ion bombardment

H. Tsuji, Y. Gotoh, J. Ishikawa, 1998 .

Slightly negative surface potential and charging model of insulator in the negative-ion implantation

H. Tsuji, Y. Gotoh, J. Ishikawa, 1997 .

Negative-ion implantation technique

H. Tsuji, S. Sakai, Y. Gotoh, 1995 .

Negative-ion implanter and formation of metal nanoparticles in glass

N. Kishimoto, Y. Gotoh, J. Ishikawa, 2000, 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).

Surface modification by negative-ion implantation

H. Tsuji, Y. Gotoh, J. Ishikawa, 2009 .

Germanium nanoparticles formation in silicon dioxide layer by multi-energy implantation of Ge negative ions and their photo-luminescence

H. Tsuji, H. Kotaki, T. Ishibashi, 2008 .

Silver Negative-Ion Implantation into Thermally Grown Thin SiO2 Film on Si Substrate and Heat Treatment for Formation of Silver Nanoparticles

H. Tsuji, H. Kotaki, Y. Gotoh, 2007 .

Germanium nanoparticle formation in thin oxide films on Si by negative-ion implantation

H. Tsuji, H. Kotaki, T. Ishibashi, 2007 .

Negative-ion implantation into thin SiO2 layer for defined nanoparticle formation

H. Tsuji, H. Kotaki, Y. Gotoh, 2006 .

Formation of mono-layered gold nanoparticles in shallow depth of SiO2 thin film by low-energy negative-ion implantation

H. Tsuji, H. Kotaki, Y. Gotoh, 2006 .

Formation of silver nanoparticles aligned near the bottom of SiO2 film on silicon substrate by negative-ion implantation and post-annealing

H. Tsuji, H. Kotaki, Y. Gotoh, 2006 .

Evaluation of nanoparticles embedded in thin silicon dioxide film by optical reflection property

H. Tsuji, H. Kotaki, Y. Gotoh, 2005 .

Delta layer formation of silver nanoparticles in thin silicon dioxide film by negative ion implantation

H. Tsuji, H. Kotaki, Y. Gotoh, 2005 .

Formation of silver nanoparticles in thin oxide layer on Si by negative-ion implantation

H. Tsuji, H. Kotaki, Y. Gotoh, 2003 .

Optical absorption properties of Cu and Ag double negative-ion implanted silica glass

N. Kishimoto, H. Tsuji, Y. Gotoh, 2002 .

Negative-ion implantation into thin SiO2 film on Si and formation of silver nanoparticles in the film

H. Tsuji, H. Kotaki, Y. Gotoh, 2002, Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on.

RF plasma sputter‐type DC‐mode heavy negative ion source

H. Tsuji, Y. Gotoh, J. Ishikawa, 1992 .

Particle-scattering phenomenon of powders caused by charging voltage of the surface during ion implantation

Y. Gotoh, J. Ishikawa, H. Tsuji, 1996, Proceedings of 11th International Conference on Ion Implantation Technology.

Fibrous structures on diamond and carbon surfaces formed by hydrogen plasma under direct-current bias and field electron-emission properties

R. Nemanich, T. Tachibana, Y. Yokota, 2003 .

Development of in situ analyzer of field emission devices

H. Tsuji, Y. Gotoh, J. Ishikawa, 2009, 2009 22nd International Vacuum Nanoelectronics Conference.

Metal-free and gasless space charge compensation of low energy ion beam by using surface-carbonized silicon field emitter array

M. Takeuchi, H. Tsuji, S. Sakai, 2010 .

Extension of lifetime of silicon field emitter arrays in oxygen ambient by carbon negative ion implantation

T. Kimoto, M. Takeuchi, H. Tsuji, 2007, 2007 IEEE 20th International Vacuum Nanoelectronics Conference.

Electron emission properties of silicon field emitter arrays in gaseous ambient for charge compensation device

T. Kimoto, M. Takeuchi, H. Tsuji, 2007, 2007 IEEE 20th International Vacuum Nanoelectronics Conference.

Production of extremely low energy electron beam with silicon-based field emitter arrays and its application to space charge neutralization of low-energy and high-current ion beam

H. Tsuji, S. Sakai, Y. Gotoh, 2012, 25th International Vacuum Nanoelectronics Conference.

10.4: Differences in deceleration performance of electrons emitted from field emitter arrays with different electrode geometries

H. Tsuji, S. Sakai, Y. Gotoh, 2010, International Vacuum Nanoelectronics Conference.

Silicon field emission array as novel charge neutralization device for high current ion implanter

H. Tsuji, M. Nagao, S. Sakai, 2005 .

Application of silicon field emitter arrays for space-charge compensation of low energy ion beam

M. Takeuchi, S. Sakai, Y. Gotoh, 2009, International Vacuum Nanoelectronics Conference.

Electron emission properties of plasma treated silicon ield emission arrays in gaseous ambient

H. Tsuji, M. Nagao, S. Sakai, 2006, 2006 International Symposium on Discharges and Electrical Insulation in Vacuum.

Compensation of space charge for positive ion beams using electron injection and confinement in nonuniform magnetic fields

S. Sakai, D. Nicolaescu, Y. Gotoh, 2011 .

Development of low energy ion beam system for space charge compensation experiments.

M. Takeuchi, H. Tsuji, S. Sakai, 2008, Review of Scientific Instruments.

Development of compact microwave ion source for low-energy application

H. Tsuji, H. Kubo, Y. Gotoh, 1998 .

Emission characteristics of Spindt-type platinum field emitters improved by operation in carbon monoxide ambient

H. Tsuji, D. Nozaki, Y. Gotoh, 2001 .

Influence of cathode material on emission characteristics of field emitters for microelectronics devices

Kazunori Inoue, Masayoshi Nagao, Yasuhito Gotoh, 1993 .

Influence of the composition of NbNx thin film field emitter array on the emission characteristics

H. Tsuji, M. Nagao, Y. Gotoh, 1999, Eleventh International Vacuum Microelectronics Conference. IVMC'98 (Cat. No.98TH8382).

Energy Distribution of Electrons Emitted from Silicon Field Emitter Arrays

H. Tsuji, S. Sakai, Y. Gotoh, 2005 .

Hafnium nitride field emitter array for field emission amplifier

H. Tsuji, Y. Gotoh, J. Ishikawa, 2009, International Vacuum Nanoelectronics Conference.

Ion beam neutralization using three-dimensional electron confinement by surface modification of magnetic poles

S. Sakai, D. Nicolaescu, Y. Gotoh, 2011 .

Development of in situ analyzer of field-emission devices

H. Tsuji, Y. Gotoh, J. Ishikawa, 2010 .

Energy distribution of the compact microwave ion source for extremely low voltage ion extraction

H. Tsuji, Y. Gotoh, J. Ishikawa, 2002 .

Electron emission properties of Spindt-type platinum field emission cathodes

K. Utsumi, H. Tsuji, M. Nagao, 2004 .

Neutralization of Space Charge Effects for Low Energy Ion Beams Using Field Emitters

S. Sakai, D. Nicolaescu, Y. Gotoh, 2008 .

Emittance of compact microwave ion source for low energy application.

H. Tsuji, S. Sakai, Y. Gotoh, 2014, The Review of scientific instruments.

On the stability of electronic perturbations on a graphite surface produced by low-energy ion bombardment

H. Tsuji, H. Kubo, Y. Gotoh, 2003 .

Work function measurement of transition metal nitride and carbide thin films

Hiroshi Tsuji, Yasuhito Gotoh, Junzo Ishikawa, 2006 .

Measurement of work function of transition metal nitride and carbide thin films

Yasuhito Gotoh, J. Ishikawa, H. Tsuji, 2003 .

Application of the focused ion beam technique to the direct fabrication of vertical-type field emitters

M. Ueda, H. Tsuji, H. Maruno, 1995 .

Ion Beam Neutralization Using FEAs and Mirror Magnetic Fields

S. Sakai, Y. Gotoh, J. Ishikawa, 2011 .

P1–6: Compensation of divergence of space charge dominated ion beams using electron injection and confinement in non-uniform magnetic fields

S. Sakai, D. Nicolaescu, Y. Gotoh, 2010, International Vacuum Nanoelectronics Conference.

Derivation of length of carbon nanotube responsible for electron emission from field emission characteristics

S. Nakata, H. Tsuji, D. Nicolaescu, 2007 .

Work Function of Low Index Crystal Facet of Tungsten Evaluated by Seppen-Katamuki Analysis

H. Tsuji, K. Mukai, Y. Gotoh, 2006, 2006 19th International Vacuum Nanoelectronics Conference.

In situ analyzer of electron emission properties: Fowler–Nordheim plotter and Seppen–Katamuki plotter

H. Tsuji, Y. Gotoh, J. Ishikawa, 2003 .

Relationships among the physical parameters required to give a linear relation between slope and intercept of Fowler-Nordheim plots.

H. Tsuji, Y. Gotoh, J. Ishikawa, 2001, Ultramicroscopy.

Estimation of Metal-Deposited Field Emitters for the Micro Vacuum Tube

H. Tsuji, M. Nagao, J. Ishikawa, 1993 .

Deposition of vanadium carbide thin films using compound target sputtering and their field emission

H. Tsuji, M. Liao, Y. Gotoh, 2005 .

Ion beam extraction with ion space‐charge compensation in beam‐plasma type ion source

T. Takagi, F. Sano, J. Ishikawa, 1982 .

Improvement of Photocatalytic Efficiencies of Rutile TiO2 by Metal Negative Ion Implantation

H. Tsuji, Y. Gotoh, J. Ishikawa, 2002 .

Multiparameter characterization of cluster ion beams

G. Takaoka, D. Nicolaescu, J. Ishikawa, 2006 .

Current status of development of ion sources in Japan from a standpoint of materials science (invited)

T. Takagi, J. Ishikawa, 1990 .

Development of microwave plasma cathode for ion sources

J. Ishikawa, Y. Matsubara, Hideaki Tahara, 1990 .

Minimum line width of ion beam-modified polystyrene by negative carbon ions for nerve-cell attachment and neurite extension

H. Tsuji, Y. Gotoh, J. Ishikawa, 2007 .

A microwave ion source and injector system for a Van de Graaff accelerator

J. Ishikawa, F. Saris, W. Urbanus, 1988 .

Improvement of the gas efficiency in a microwave plasma cathode type oxygen ion source

K. Ogata, J. Ishikawa, T. Mikami, 1994 .

OXYGEN ION SOURCE WITH MICROWAVE PLASMA (MP) CATHODE FOR ION BEAM ASSISTED DEPOSITION

J. Ishikawa, Y. Matsubara, Hideaki Tahara, 1993 .

Development of oxygen ion source with microwave plasma cathode

J. Ishikawa, Y. Matsubara, Hideaki Tahara, 1992 .

Negative‐ion production probability in rf plasma sputter‐type heavy negative‐ion sourcea)

H. Tsuji, Y. Gotoh, J. Ishikawa, 1994 .

Line-width of ion beam-modified polystyrene by negative carbon ions for fine adhesion pattern of mesenchymal stem cells

H. Kojima, H. Tsuji, G. Takaoka, 2011 .

Epitaxial growth of carbon-doped p-type GaAs films by ionized cluster beam

H. Tsuji, G. Takaoka, J. Ishikawa, 1991 .

Ionized cluster beam deposition of Hg1−xCdxTe films and their optical properties

T. Takagi, G. Takaoka, J. Ishikawa, 1989 .

Silicon Oxide Film Formation by the Simultaneous use of a Microwave Ion Source and an Icb System

H. Tsuji, G. Takaoka, J. Ishikawa, 1989 .

The field emitter array for neutralization of positive ion charge in ion implantation system

H. Tsuji, M. Nagao, S. Sakai, 2003, IEEE/CPMT/SEMI. 28th International Electronics Manufacturing Technology Symposium (Cat. No.03CH37479).

Comparison of silicon etching properties between F/sup -/ negative ion and SF/sub 3//sup +/ positive ion-beam etchings

Y. Gotoh, J. Ishikawa, H. Tsuji, 1998, 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).

Negative-ion production of reactive elements from compound gases in the RF plasma-sputter-type heavy negative-ion source

Y. Gotoh, J. Ishikawa, T. Tomita, 1996, Proceedings of 11th International Conference on Ion Implantation Technology.

Negative‐ion extraction of gaseous materials from a radio frequency plasma‐sputter‐type heavy negative‐ion source

H. Tsuji, Y. Gotoh, J. Ishikawa, 1996 .

Intense metal-ion-beam production using an impregnated-electrode-type liquid-metal ion source

T. Takagi, H. Tsuji, J. Ishikawa, 1990 .

Adhesion patterning of mesenchymal stem cells on polystyrene surface by carbon negative-ion implantation and neuron differentiation on the position

H. Tsuji, Y. Gotoh, J. Ishikawa, 2008 .

Silicon nitride and oxide film formation by the simultaneous use of a microwave ion source and an ICB system

T. Takagi, K. Matsugatani, G. Takaoka, 1989 .

Slit extraction type compact microwave ion source

T. Takagi, H. Tsuji, J. Ishikawa, 1989 .

Optimization of Compact Microwave Ion Source for Generation of High Current and Low Energy Ion Beam

H. Tsuji, S. Sakai, Y. Gotoh, 2011 .

Optical properties of a low energy focused ion beam apparatus for direct deposition

M. Ueda, H. Maruno, J. Ishikawa, 1997 .

Metal-sheet-beam formation using an impregnated electrode-type liquid-metal ion source with a linear array of emission points

H. Tsuji, Y. Gotoh, J. Ishikawa, 1993 .

Milliampere metal ion beam formation using multipoint emission by an impregnated-electrode-type liquid-metal ion source

H. Tsuji, Y. Gotoh, J. Ishikawa, 1991 .

The properties of high-intensity impregnated-electrode-type liquid-metal ion sources

J. Ishikawa, 1989 .

Intense metal ion beam formation by an impregnated-electrode-type liquid metal ion source

T. Takagi, H. Tsuji, J. Ishikawa, 1989 .

Surface modification of silica glass by CHF3 plasma treatment and carbon negative-ion implantation for cell pattern adhesion

H. Kojima, H. Tsuji, G. Takaoka, 2011 .

Negative ion implantation for pattering mesenchymal-stem cell adhesion on silicone rubber and differentiation into nerve cells with keeping their adhesion pattern

H. Tsuji, Y. Gotoh, J. Ishikawa, 2009 .

Modification of Polystyrene Surface for Neuron Cell Attachment Properties by Negative Ion Implantation and Pattern Treatment

H. Tsuji, H. Sasaki, Y. Gotoh, 2001 .

Field electron emission from nanostructured heterogeneous HfNxOy films

H. Tsuji, M. Liao, Y. Gotoh, 2003 .

Surface modification of TiO2 (rutile) by metal negative ion implantation for improving catalytic properties

H. Tsuji, Y. Gotoh, J. Ishikawa, 2002 .

Development of an ultrasmall C-band linear accelerator guide for a four-dimensional image-guided radiotherapy system with a gimbaled x-ray head.

Masahiro Hiraoka, Masaki Kokubo, Yuichiro Kamino, 2007, Medical physics.

Self-aligned formation of a vertical-type micro field emitter with a volcano-shaped gate electrode protruding towards the cathode by focused ion-beam sputter etching and deposition

M. Ueda, H. Tsuji, Y. Gotoh, 1999 .

Molecular ion implanter equipped with liquid-metal alloy ion source

H. Tsuji, Y. Gotoh, J. Ishikawa, 2000 .

Discharge characteristics of helium under inhomogeneous pressure distribution

H. Tsuji, Y. Gotoh, J. Ishikawa, 2006, International Symposium on Discharges and Electrical Insulation in Vacuum.

Grain boundary diffusion control of Cu films prepared by the ICB technique

T. Takagi, G. Takaoka, J. Ishikawa, 1989 .

Development of key technologies for carbon nanotube FEDs in Japanese national project

S. Uemura, S. Nakata, M. Takai, 2005, 2005 International Vacuum Nanoelectronics Conference.

Luminescence properties of Ge implanted SiO2:Ge and GeO2:Ge films

H. Tsuji, H. Kotaki, T. Ishibashi, 2009 .

Surface and interface characteristics of Cu films deposited by ionized cluster beam

T. Takagi, G. Takaoka, J. Ishikawa, 1990 .

Focused ion beam direct deposition of gold

Masahiro Ueda, Hiromasa Maruno, Masatoshi Asari, 1993 .

High-intensity negative ion sources for material science applications

J. Ishikawa, 2007 .

Dependence of carbon interatomic bonds on incident ion energy in carbon negative ion beam deposited films

H. Tsuji, Y. Gotoh, J. Ishikawa, 1999 .

Focused ion‐beam direct deposition of metal thin film

M. Ueda, H. Maruno, J. Ishikawa, 1996 .

Focused ion beam direct deposition and its applications

M. Ueda, J. Ishikawa, S. Nagamachi, 1998 .

Metal negative-ion implantation into rutile TiO2 and enhancement of photocatalytic property under irradiation of fluorescent light

H. Tsuji, Y. Gotoh, J. Ishikawa, 2002, Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on.

Direct deposition of focused ion beams with an impregnated-electrode-type liquid metal ion source

T. Takagi, H. Tsuji, J. Ishikawa, 1989 .

Silver negative-ion implantation to sol–gel TiO2 film for improving photocatalytic property under fluorescent light

H. Tsuji, Y. Gotoh, J. Ishikawa, 2005 .

Photocatalytic properties of sol–gel titania film under fluorescent-light irradiation improved by silver negative-ion implantation

H. Tsuji, Y. Gotoh, J. Ishikawa, 2006 .