N. Danson

发表

Novel techniques for the control of the properties of reactively-sputtered thin films

N. Danson, 1996 .

High rate reactive sputtering using gas pulsing

R. Howson, N. Danson, I. Safi, 1999 .

Improved control techniques for the reactive magnetron sputtering of silicon to produce silicon oxide and the implications for selected film properties

R. Howson, N. Danson, G. W. Hall, 1996 .

High rate reactive sputtering using gas pulsing: a technique for the creation of films onto large, flat substrates

R. Howson, N. Danson, I. Safi, 1999 .

REACTIVE MAGNETRON SPUTTERING OF SILICON TO PRODUCE SILICON OXIDE

R. Howson, N. Danson, G. W. Hall, 1997 .

The properties of reactively sputtered, stoichiometry-controlled and optimum-conductivity transparent zinc/aluminium oxide films as a function of their aluminium content

R. Howson, N. Danson, I. Safi, 1998 .

Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates

R. Howson, N. Danson, I. Safi, 1998 .

Sputtering of indium-tin oxide

R. Howson, N. Danson, I. Safi, 1997 .