C. Nender

发表

A physical model for eliminating instabilities in reactive sputtering

Sören Berg, C Nender, H. Blom, 1988 .

The influence of the deposition angle on the composition of reactively sputtered thin films

S. Berg, T. Nyberg, C. Nender, 1997 .

The use of process modelling for optimum design of reactive sputtering processes

H. Blom, S. Berg, C. Nender, 1989 .

Dynamic modeling of the process control of reactive sputtering

H. Blom, S. Berg, C. Nender, 1989 .

Hysteresis effects in the sputtering process using two reactive gases

S. Berg, H. Barankova, C. Nender, 1995 .

Reactive sputtering using two reactive gases, experiments and computer modeling

S. Berg, H. Barankova, C. Nender, 1993 .

Modeling of multicomponent reactive sputtering

H. Blom, S. Berg, C. Nender, 1991 .

Studies of reactive sputtering of multi-phase chromium nitride

S. Berg, T. Nyberg, J. Nordgren, 1997 .

T-DYN Monte Carlo simulations applied to ion assisted thin film processes

Sören Berg, Jp Biersack, C Nender, 1991 .

Modeling of reactive sputtering of compound materials

Sören Berg, C Nender, Hans-Olof Blom, 1987 .

Process modeling of reactive sputtering

Sören Berg, C Nender, Hans-Olof Blom, 1989 .

Predicting thin‐film stoichiometry in reactive sputtering

Sören Berg, C Nender, Hans-Olof Blom, 1988 .

The steady state in net erosion and net growth regimes during simultaneous ion bombardment and atomic deposition processes

I. Katardjiev, G. Carter, M. Nobes, 1994 .

Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process

H. Blom, S. Berg, T. Nyberg, 1998 .

Composition control by current modulation in dc-reactive sputtering

S. Berg, T. Nyberg, C. Nender, 1998 .

In situ diagnostic studies of reactive co-sputtering from two targets by means of soft x-ray and optical emission spectroscopy

S. Berg, T. Nyberg, J. Nordgren, 1997 .

Patterning with the use of ion-assisted selective deposition

S. Berg, C. Nender, B. Gelin, 1989 .

Oxide Breakdown due to Charge Accumulation during Plasma Etching

S. Berg, H. Norström, C. Nender, 1987 .

Ion assisted selective deposition of thin films

S. Berg, C. Nender, B. Gelin, 1988 .

Atom assisted sputtering yield amplification

I. Katardjiev, S. Berg, C. Nender, 1992 .

Ion-assisted selective deposition of aluminium for via-hole interconnections

I. Katardjiev, S. Berg, C. Nender, 1993 .