N. Malkomes

发表

Dynamic simulation of process control of the reactive sputter process and experimental results

N. Malkomes, M. Vergöhl, 2001 .

Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control

Michael Vergöhl, U. Richter, T. Staedler, 1999 .

Real time control of reactive magnetron-sputter deposited optical filters by in situ spectroscopic ellipsometry

G. Bräuer, N. Malkomes, M. Vergöhl, 2000 .

Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics

B. Szyszka, T. Matthée, N. Malkomes, 2000 .

Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering

B. Szyszka, N. Malkomes, M. Vergöhl, 2001 .

Optimization of the reflectivity of magnetron sputter deposited silver films

Günter Bräuer, Michael Vergöhl, Bernd Szyszka, 2000 .

Nonclassical impedance control of the high rate midfrequency reactive magnetron sputter process using harmonic analysis

B. Szyszka, N. Malkomes, 2001 .