I. Safi

发表

Recent aspects concerning DC reactive magnetron sputtering of thin films: a review

I. Safi, I. Safi, 2000 .

High rate reactive sputtering using gas pulsing

R. Howson, N. Danson, I. Safi, 1999 .

Recent aspects concerning DC reactive magnetron sputtering of thin films: a review

I. Safi, I. Safi, 2000 .

High rate reactive sputtering using gas pulsing: a technique for the creation of films onto large, flat substrates

R. Howson, N. Danson, I. Safi, 1999 .

The properties of reactively sputtered, stoichiometry-controlled and optimum-conductivity transparent zinc/aluminium oxide films as a function of their aluminium content

R. Howson, N. Danson, I. Safi, 1998 .

The properties of reactively-sputtered, stoichiometry-controlled and optimum-conductivity transparent indium oxide films as a function of their titanium, aluminium and zinc content; comparisons with the use of tin as a dopant

R. Howson, I. Safi, 1999 .

Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates

R. Howson, N. Danson, I. Safi, 1998 .

Sputtering of indium-tin oxide

R. Howson, N. Danson, I. Safi, 1997 .