G. Beister

发表

Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode

S. Schiller, G. Beister, W. Sieber, 1984 .

Properties of cadmium stannate thin films produced by reactive high rate d.c. magnetron-plasmatron sputtering

S. Schiller, G. Beister, E. Buedke, 1982 .

TiN hard coatings deposited on high‐speed steel substrates by reactive direct current magnetron sputtering

S. Schiller, J. Reschke, G. Beister, 1987 .

Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering

S. Schiller, E. Hacker, G. Beister, 1981 .

Technical note: Optical properties of reactively evaporated SiOx films

S. Schiller, G. Beister, 1987 .

Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering

S. Schiller, U. Heisig, C. Korndörfer, 1984 .

Features of and IN SITU measurements on absorbing TiOx films produced by reactive d.c. magnetron-plasmatron sputtering☆

S. Schiller, G. Beister, W. Sieber, 1980 .

High‐rate vapor deposition and large systems for coating processes

S. Schiller, U. Heisig, G. Beister, 1987 .