Gregory P. Hughes

Printability of quartz defects in a production Cr-less mask process

Jason Hickethier, Gregory P. Hughes, Susan MacDonald, 2006, SPIE Advanced Lithography.

Mighty high-T lithography for 65-nm generation contacts

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Strategies for predictive control of chrome stress-induced registration errors

Roxann L. Engelstad, Andrew R. Mikkelson, Alexander C. Wei, 2003, SPIE Advanced Lithography.

Imaging study of positive and negative tone weak phase-shifted 65 nm node contacts

Robert T. Greenway, John S. Petersen, James V. Beach, 2004, SPIE Advanced Lithography.

Through pitch intensity balancing and phase error analysis of 193-nm alternating phase shift masks

Kent H. Nakagawa, Peter D. Buck, Gregory P. Hughes, 2004, SPIE Advanced Lithography.

Phase standard based on profilometer metrology standard

Alex Buxbaum, Troy Morrison, Gregory P. Hughes, 2004, SPIE Photomask Technology.

Analysis of off-axis-illumination-based phase-edge/chromeless mask technologies

Ebo H. Croffie, Neal P. Callan, Gregory P. Hughes, 2004, SPIE Advanced Lithography.