S. Shibuki

Copper film formation using electron cyclotron resonance plasma sputtering and reflow method

S. Shibuki, H. Kanao, T. Akahori, 1997 .

Using a highly accurate self-stop Cu-CMP model in the design flow

Takashi Sakairi, Jeff Wilson, Shunichi Shibuki, 2010, Advanced Lithography.