Kevin D. Lucas

发表

Rigorous EUV mask simulator using 2D and 3D waveguide methods

Zhengrong Zhu, Kevin D. Lucas, Jonathan L. Cobb, 2003, SPIE Advanced Lithography.

Practical quality metrics for resolution enhancement software

Kevin D. Lucas, Robert Boone, Raphael Wynd, 2003, SPIE Advanced Lithography.

CPL mask technology for sub-100-nm contact hole imaging

Kevin D. Lucas, Christopher J. Progler, J. Fung Chen, 2004, Photomask Japan.

Cost of ownership reduction for OPC development and production

Kevin D. Lucas, Robert Boone, Alfred J. Reich, 2004, SPIE Advanced Lithography.

Mighty high-T lithography for 65-nm generation contacts

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Antireflective coating optimization techniques for sub-0.2-μm geometries

Kevin D. Lucas, C. Cook, K. Lee, 1999, Advanced Lithography.

Resist reflow for 193-nm low-K1 lithography contacts

Kevin D. Lucas, Mireille Maenhoudt, Grozdan Grozev, 2003, SPIE Advanced Lithography.

Practicing extension of 248-nm DUV optical lithography using trim-mask PSM

Chong-Cheng Fu, John L. Sturtevant, Linard Karklin, 1999, Advanced Lithography.

Lithography simulation of contamination-caused defects

Kevin D. Lucas, Andrzej J. Strojwas, Zhi-Min Ling, 1995, Advanced Lithography.

Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection

Kevin D. Lucas, Jonathan L. Cobb, Scott Daniel Hector, 2002, SPIE Advanced Lithography.

Re-evaluating simple lambda-based design rules for low-K1 lithography process control

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2000, Advanced Lithography.

Lithography: Concepts, Challenges and Prospects

Kevin D. Lucas, Scott Daniel Hector, Sergei V. Postnikov, 2003 .

Intensity optimization for phase-shifting masks

Kevin D. Lucas, Andrzej J. Strojwas, Chi-Min Yuan, 1993, Advanced Lithography.

Considerations for the use of application-specific photoresists

Kevin D. Lucas, Chris A. Mack, John S. Petersen, 1999, Advanced Lithography.

Monte Carlo method for highly efficient and accurate statistical lithography simulations

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2002, SPIE Advanced Lithography.

Characterization of CD control for sub-0.18-μm lithographic patterning

Chong-Cheng Fu, John L. Sturtevant, Kevin D. Lucas, 1999, Advanced Lithography.

Combining OPC and design for printability into 65-nm logic designs

Kevin D. Lucas, Jonathan L. Cobb, Robert Boone, 2004, SPIE Advanced Lithography.

CD error budget analysis for 0.18-μm inlaid trench lithography

Chong-Cheng Fu, John L. Sturtevant, Kevin D. Lucas, 1999, Advanced Lithography.

Efficient workstation-based 3D model for optical alignment simulation

Andrzej J. Strojwas, Kevin D. Lucas, Chi-Min Yuan, 1996, Advanced Lithography.

Evaluation of new attenuating phase-shifting mask techniques

Kevin D. Lucas, Andrzej J. Strojwas, K. K. Low, 1994, Advanced Lithography.

Efficient 3D phase-shifting mask lithography simulation

Kevin D. Lucas, Andrzej J. Strojwas, Hiroyoshi Tanabe, 1995, Advanced Lithography.

Rigorous and practical vector model for phase-shifting masks in optical lithography

Kevin D. Lucas, Andrzej J. Strojwas, Chi-Min Yuan, 1992, Advanced Lithography.

ArF lithography options for 100-nm technologies

Geert Vandenberghe, Kurt G. Ronse, Kevin D. Lucas, 2001, SPIE Advanced Lithography.

0.25-μm logic manufacturability using practical 2D optical proximity correction

Kevin D. Lucas, Alfred J. Reich, Paul G. Y. Tsui, 1998, Advanced Lithography.

METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination

Zhengrong Zhu, Kevin D. Lucas, Jonathan L. Cobb, 2003, SPIE Photomask Technology.

Efficient and Rigorous 3D Model for Optical Lithography Simulation

Andrzej J. Strojwas, Kevin D. Lucas, Chi-Min Yuan, 1995 .

Optimization of the contact layer for 90-nm node lithography

Kevin D. Lucas, Kirk J. Strozewski, Lena Zavyalova, 2003, SPIE Advanced Lithography.

Characterization of optical proximity correction features

John L. Sturtevant, Kevin D. Lucas, John Miller, 2001, SPIE Advanced Lithography.

Vector modeling of defects and defect repair for phase-shifting masks

Kevin D. Lucas, Andrzej J. Strojwas, 1993, Photomask Technology.

Fast modeling of 3D planar resist images for high-NA projection lithography

Kevin D. Lucas, Tariel M. Makhviladze, Vladimir V. Ivin, 1997, Advanced Lithography.

Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Photomask Technology.

Efficient and rigorous three-dimensional model for optical lithography simulation

Kevin D. Lucas, Andrzej J. Strojwas, Hiroyoshi Tanabe, 1996 .

Lithographic process window analysis by statistical means

Kevin D. Lucas, Anatoly Bourov, Sergei V. Postnikov, 2002, SPIE Advanced Lithography.

MEV as a new constraint for lithographers in the sub-100-nm regime

Kevin D. Lucas, Jerome Belledent, Sergei V. Postnikov, 2004, SPIE Advanced Lithography.

193-nm contact photoresist reflow feasibility study

Frieda Van Roey, Kevin D. Lucas, Monique Ercken, 2001, SPIE Advanced Lithography.

Model-based OPC for first-generation 193-nm lithography

Geert Vandenberghe, Kevin D. Lucas, Staf Verhaegen, 2001, SPIE Advanced Lithography.

CPL reticle technology for advanced device applications

Kevin D. Lucas, Philippe Thony, Christopher J. Progler, 2004, Photomask Japan.

Extension of the traditional optical model for investigation into EUV projection lithography capabilities

Kevin D. Lucas, Vladimir V. Ivin, Tariel M. Makhviladze, 1998, Advanced Lithography.

Method of easily extracting resist development parameters for lithography simulation

Kevin D. Lucas, Tariel M. Makhviladze, Vladislav Kudrya, 1996, Advanced Lithography.

High-NA ArF lithography for 70-nm technologies

Geert Vandenberghe, Kevin D. Lucas, Patrick K. Montgomery, 2002, SPIE Advanced Lithography.

Die-to-die and die-to-database capability analysis for advanced OPC inspection

Kevin D. Lucas, John Riddick, Franklin D. Kalk, 1999, Photomask Technology.

The impact of MEEF through pitch for 120-nm contact holes

Will Conley, Kevin D. Lucas, Robert John Socha, 2004, SPIE Advanced Lithography.

Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2001, SPIE Advanced Lithography.

Closing the defect printability loop: optimizing defect specifications for an established lithographic process

Kevin D. Lucas, Jerome Belledent, Christophe Couderc, 2004, SPIE Photomask Technology.

The application of CPL reticle technology for the 0.045-mm node

Will Conley, Kevin D. Lucas, Fung Chen, 2004, SPIE Advanced Lithography.

Investigation of product design weaknesses using model-based OPC sensitivity analysis

Kevin D. Lucas, Cesar M. Garza, Sergei V. Postnikov, 2003, SPIE Advanced Lithography.