Jonathan L. Cobb

发表

Rigorous EUV mask simulator using 2D and 3D waveguide methods

Zhengrong Zhu, Kevin D. Lucas, Jonathan L. Cobb, 2003, SPIE Advanced Lithography.

Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets

Jonathan L. Cobb, Scott Daniel Hector, Sergei V. Postnikov, 2004, SPIE Advanced Lithography.

Controlling line-edge rougness to within reasonable limits

Jonathan L. Cobb, Aaron Thean, Shahid Rauf, 2003, SPIE Advanced Lithography.

The impact of mask topography on CD control

Jonathan L. Cobb, Bernard J. Roman, Vladimir Ivin, 2005, SPIE Advanced Lithography.

Estimated impact of shot noise in extreme-ultraviolet lithography

Jonathan L. Cobb, Gregg M. Gallatin, Frances A. Houle, 2003, SPIE Advanced Lithography.

Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection

Kevin D. Lucas, Jonathan L. Cobb, Scott Daniel Hector, 2002, SPIE Advanced Lithography.

Line-edge roughness reduction and CD slimming using hardback processing

Frieda Van Roey, Jonathan L. Cobb, Monique Ercken, 2003, SPIE Advanced Lithography.

Combining OPC and design for printability into 65-nm logic designs

Kevin D. Lucas, Jonathan L. Cobb, Robert Boone, 2004, SPIE Advanced Lithography.

Development and characterization of 193-nm ultra-thin resist process

Jonathan L. Cobb, Richard D. Peters, Gilles R. Amblard, 2002, SPIE Advanced Lithography.

Sub-100-nm lithographic imaging with an EUV 10X microstepper

Kenneth A. Goldberg, Jonathan L. Cobb, Patrick P. Naulleau, 1999, Advanced Lithography.

METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination

Zhengrong Zhu, Kevin D. Lucas, Jonathan L. Cobb, 2003, SPIE Photomask Technology.

Integration of ultrathin resist processes into MPU IC manufacturing flows

Will Conley, Jonathan L. Cobb, Scott D. Hector, 2001, SPIE Advanced Lithography.

Fabrication of integrated circuits with high yield using ultra-thin resist processes

Jonathan L. Cobb, Scott D. Hector, Sergei V. Postnikov, 2003, SPIE Advanced Lithography.

Ultrathin photoresists for EUV lithography

Jonathan L. Cobb, Robert L. Brainard, Pawitter J. S. Mangat, 1999, Advanced Lithography.

High transmission mask technology for 45nm node imaging

Will Conley, Jonathan L. Cobb, Chris Progler, 2006, SPIE Advanced Lithography.

Integration of UTR processes into MPU IC manufacturing flows

Jonathan L. Cobb, Scott D. Hector, Wei Wu, 2002, SPIE Advanced Lithography.

Tunable transmission phase mask options for 65/45nm node gate and contact processing

Will Conley, Jonathan L. Cobb, Michael Cangemi, 2004, SPIE Advanced Lithography.

Defects and metrology of ultrathin resist films

Jonathan L. Cobb, Kevin M. Monahan, Paul M. Dentinger, 2000, Advanced Lithography.

Defect printability and inspection of EUVL mask

Jonathan L. Cobb, Scott D. Hector, James R. Wasson, 2004, SPIE Photomask Technology.

Novel silicon-containing resists for EUV and 193-nm lithography

Jonathan L. Cobb, Veena Rao, Uzodinma Okoroanyanwu, 1999, Advanced Lithography.

Extendibility of chemically amplified resists: another brick wall?

Martha I. Sanchez, Gregory M. Wallraff, William D. Hinsberg, 2003, SPIE Advanced Lithography.

Bremsstrahlung emission and absorption in electron projection lithography

Jonathan L. Cobb, Scott Daniel Hector, Vladimir Ivin, 2001, SPIE Advanced Lithography.

EUV photoresist performance results from the VNL and the EUV LLC

Martha I. Sanchez, William D. Hinsberg, Jonathan L. Cobb, 2002, SPIE Advanced Lithography.

Reduction of line edge roughness and post resist trim pattern collapse for sub 60 nm gate patterns using gas-phase resist fluorination

Jonathan L. Cobb, Colita Parker, Richard D. Peters, 2004, SPIE Advanced Lithography.

Single-layer and bilayer resist processes for EUV-type integrations

Jonathan L. Cobb, Eric Weisbrod, Colita Parker, 2004, SPIE Advanced Lithography.

Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography

Jonathan L. Cobb, Scott Daniel Hector, Pawitter J. S. Mangat, 1999 .

Current Status of EUV Photoresists

Jonathan L. Cobb, Robert L. Brainard, Charlotte A. Cutler, 2003 .

Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation

Jonathan L. Cobb, Robert L. Brainard, Veena Rao, 1999 .

MODULATION OF THE CHARGE OF A SINGLE-ELECTRON TRANSISTOR BY DISTANT DEFECTS

Jonathan L. Cobb, Neil M. Zimmerman, Alan F. Clark, 1997 .

Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber

Jonathan L. Cobb, Scott Daniel Hector, William J. Dauksher, 1999 .

EUV Lithography: Patterning to the End of the Road

Jonathan L. Cobb, Robert L. Brainard, Donna J. O'Connell, 2001 .

Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography

Jonathan L. Cobb, Gregg M. Gallatin, Frances A. Houle, 2003 .