Andrzej J. Strojwas

发表

Rigorous EUV mask simulator using 2D and 3D waveguide methods

Zhengrong Zhu, Kevin D. Lucas, Jonathan L. Cobb, 2003, SPIE Advanced Lithography.

A superfast 3D lithography simulator and its application for ULSI printability analysis

Zhengrong Zhu, Andrzej J. Strojwas, 2004, SPIE Advanced Lithography.

Local loops for robust inter-layer routing at sub-20 nm nodes

Lars W. Liebmann, Neal Lafferty, Andrzej J. Strojwas, 2012, Advanced Lithography.

Design for Manufacturability in the Nanometer Era

Andrzej J. Strojwas, Nicola Dragone, Carlo Guardiani, 2016 .

Accurate prediction of kill ratios based on KLA defect inspection and critical area analysis

Andrzej J. Strojwas, Akiva Elias, Wojciech P. Maly, 1996, Advanced Lithography.

Yield modelling and defect tolerance in VLSI : papers presented at the International Workshop on Designing for Yield, Oxford, 1-3 July 1987

Andrzej J. Strojwas, Wojciech Maly, Will Moore, 1988 .

Lithography simulation of contamination-caused defects

Kevin D. Lucas, Andrzej J. Strojwas, Zhi-Min Ling, 1995, Advanced Lithography.

Modeling of defect propagation/growth for in-line defect inspection optimization in VLSI fabrication

Andrzej J. Strojwas, Xiaolei Li, L. Milor, 1997, 1997 2nd International Workshop on Statistical Metrology.

A sparse macromodeling method for RC interconnect multiports

Ying Liu, Andrzej J. Strojwas, Larry Pileggi, 1997, Proceedings of CICC 97 - Custom Integrated Circuits Conference.

Application of rigorous topography simulation for modeling of defect propagation/growth in VLSI fabrication

Andrzej J. Strojwas, Xiaolei Li, L. Milor, 1997, Advanced Lithography.

Three-dimensional modeling of wafer inspection schemes for sub-70-nm lithography

Zhengrong Zhu, Andrzej J. Strojwas, A. L. Swecker, 2002, SPIE Advanced Lithography.

Intensity optimization for phase-shifting masks

Kevin D. Lucas, Andrzej J. Strojwas, Chi-Min Yuan, 1993, Advanced Lithography.

Selected papers on statistical design of integrated circuits

Andrzej J. Strojwas, 1987 .

Chip-scale 3D topography synthesis

Andrzej J. Strojwas, Wojciech Maly, Xiaolei Li, 1998, Advanced Lithography.

Evaluation of new attenuating phase-shifting mask techniques

Kevin D. Lucas, Andrzej J. Strojwas, K. K. Low, 1994, Advanced Lithography.

Monitoring VLSIC fabrication processes: a Bayesian approach

Andrzej J. Strojwas, John Lehoczky, S. Rao, 1995, Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop.

Efficient 3D phase-shifting mask lithography simulation

Kevin D. Lucas, Andrzej J. Strojwas, Hiroyoshi Tanabe, 1995, Advanced Lithography.

Rigorous and practical vector model for phase-shifting masks in optical lithography

Kevin D. Lucas, Andrzej J. Strojwas, Chi-Min Yuan, 1992, Advanced Lithography.

A study of defect propagation/growth for VLSI manufacturing yield impact prediction

Andrzej J. Strojwas, A. L. Swecker, Xiaolei Li, 1997, 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023).

A Unified Approach for Timing Verification and Delay Fault Testing

Andrzej J. Strojwas, Mukund Sivaraman, 1997 .

Rethinking ASIC design with next generation lithography and process integration

Lars W. Liebmann, Andrzej J. Strojwas, Larry Pileggi, 2013, Advanced Lithography.

METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination

Zhengrong Zhu, Kevin D. Lucas, Jonathan L. Cobb, 2003, SPIE Photomask Technology.

Design and manufacturability tradeoffs in unidirectional and bidirectional standard cell layouts in 14 nm node

Lars W. Liebmann, Neal Lafferty, Andrzej J. Strojwas, 2012, Advanced Lithography.

Monitoring multi-stage sequential manufacturing processes: a Bayesian approach

Andrzej J. Strojwas, S. Rao, John Lehoczky, 1995, Proceedings of International Symposium on Semiconductor Manufacturing.

Excursion detection and source isolation in defect inspection and classification [VLSI manufacture]

Andrzej J. Strojwas, Ram Akella, W. Shindo, 1997, 1997 2nd International Workshop on Statistical Metrology.

Model-based equipment diagnosis

David J. Collins, Andrzej J. Strojwas, P. K. Mozumder, 1994, Advanced Lithography.

A methodology for improved circuit simulation efficiency via topology-based variable accuracy device modeling

Andrzej J. Strojwas, Kimon Michaels, 1992, 1992 IEEE/ACM International Conference on Computer-Aided Design.

Characterization of defect detection schemes using rigorous 3D EM field simulation

Andrzej J. Strojwas, A. L. Swecker, Ady Levy, 1997, Advanced Lithography.

Vector modeling of defects and defect repair for phase-shifting masks

Kevin D. Lucas, Andrzej J. Strojwas, 1993, Photomask Technology.

Efficient and rigorous three-dimensional model for optical lithography simulation

Kevin D. Lucas, Andrzej J. Strojwas, Hiroyoshi Tanabe, 1996 .

Effective excursion detection and source isolation with defect inspection and classification

Andrzej J. Strojwas, Ram Akella, W. Shindo, 1997, 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ASMC 97 Proceedings.

Propagation of EM waves in axial symmetric structures and its implication for 3D rigorous lithography process simulation

Zhengrong Zhu, Andrzej J. Strojwas, 2004, SPIE Advanced Lithography.

Design implications of extremely restricted patterning

Lars W. Liebmann, Andrzej J. Strojwas, Larry Pileggi, 2014 .

METRO-3D: an efficient three-dimensional wafer inspection simulator for next generation lithography

Zhengrong Zhu, Andrzej J. Strojwas, A. L. Swecker, 2002, 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259).

Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing

Andrzej J. Strojwas, Chi-Min Yuan, A. Strojwas, 1990, Advanced Lithography.

Monitoring multistage integrated circuit fabrication processes

Andrzej J. Strojwas, S.S.P. Rao, John Lehoczky, 1996 .

Modeling of defect propagation/growth for yield impact prediction in VLSI manufacturing

Andrzej J. Strojwas, A. L. Swecker, Xiaolei Li, 1997, Advanced Lithography.

In-line yield prediction methodologies using patterned wafer inspection information

Andrzej J. Strojwas, Wojciech Maly, R. K. Nurani, 1998 .