Yuuichi Yoshida

Dry etch technology development for NIL template

Tsuyoshi Amano, Naoya Hayashi, Nobuhito Toyama, 2006, Photomask Japan.

Defect inspection and repair performance on CPL masks for 90 and 65nm node line patterns

Yasutaka Morikawa, Naoya Hayashi, Hiroshi Mohri, 2004, SPIE Photomask Technology.

NIL template making and imprint evaluation

Satoshi Yusa, Naoya Hayashi, Nobuhito Toyama, 2006, SPIE Photomask Technology.

Mask CD measurements with an atomic force microscope

Naoya Hayashi, Hiroshi Mohri, Shiho Sasaki, 2004, Photomask Japan.

PSM quartz etch depth evaluation with an atomic force microscope

Yasutaka Morikawa, Naoya Hayashi, Takashi Adachi, 2003, Photomask Japan.

Patterning process development for NIL templates

Naoya Hayashi, Tsuyoshi Amano, Nobuhito Toyama, 2011 .