Richard Yuqiang Tu

Bi/In bimetallic thermal resists for microfabrication, photomasks, and micromachining applications

Glenn H. Chapman, Marinko V. Sarunic, Richard Yuqiang Tu, 2002, SPIE Advanced Lithography.

Bimetallic thermal activated films for microfabrication, photomasks, and data storage

Glenn H. Chapman, Marinko V. Sarunic, Richard Yuqiang Tu, 2002, SPIE LASE.

Bimetallic Thermal Resists for Photomask, Micromachining and Microfabrication

Richard Yuqiang Tu, R. Tu, 2004 .