M. A. Blauw

High-rate plasma-deposited SiO2 films for surface passivation of crystalline silicon

Bram Hoex, M.C.M. van de Sanden, B. Hoex, 2006 .

Advanced time-multiplexed plasma etching of high aspect ratio silicon structures

Patrick J. French, W. G. Sloof, E. V. D. Drift, 2002 .

The etching of silicon carbide in inductively coupled SF6/O2 plasma

Rebecca Cheung, R. Cheung, E. V. D. Drift, 2003 .

Deep Reactive Ion Etching of Through Silicon Vias

Fred Roozeboom, Wouter Dekkers, Eric Cornelis Egbertus Van Grunsven, 2008 .

Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

Pasqualina M. Sarro, Patrick J. French, P. Sarro, 2002 .

Dry etching of SiC in inductively coupled Cl2/Ar plasma

Liudi Jiang, Rebecca Cheung, N. O. V. Plank, 2004 .

Deep anisotropic dry etching of silicon microstructures by high-density plasmas

M. A. Blauw, 2004 .