Yasuhiro Kishikawa

Precise in-situ transmission measurement system at 157 nm

Seiji Takeuchi, Yasuhiro Kishikawa, Minoru Yoshii, 2003, SPIE Optics + Photonics.

Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography

Yasuhiro Kishikawa, Yuichi Iwasaki, Seiji Takeuchi, 2007, SPIE Advanced Lithography.

What determines the ultimate resolution? The critical relationship between exposure tools and photoresists

Yasuhiro Kishikawa, Yuichi Iwasaki, Miyoko Kawashima, 2006, SPIE Advanced Lithography.

ArF immersion lithography: critical optical issues

Yasuhiro Kishikawa, Akiyoshi Suzuki, Hiroshi Ohsawa, 2004, SPIE Advanced Lithography.

Analysis of imaging properties for hyper-NA ArF immersion lithography

Yasuhiro Kishikawa, Akiyoshi Suzuki, Yuichi Iwasaki, 2004, SPIE Advanced Lithography.

Influence of resist blur on ultimate resolution of ArF immersion lithography

Yasuhiro Kishikawa, Miyoko Kawashima, Akinori Ohkubo, 2006 .